Improved Coking Resistance of “Intelligent” Ni Catalysts Prepared by Atomic Layer Deposition

Conformal CaTiO3 films were deposited onto MgAl2O4 by atomic layer deposition (ALD) and then examined as “intelligent” catalyst supports for Ni in the steam and CO2 reforming of methane. CaTiO3 films (1 nm) were characterized by scanning transmission electron microscopy and XRD and shown to be stabl...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	ACS catalysis 2018-08, Vol.8 (8), p.7679-7687
Hauptverfasser:	Lin, Chao, Jang, Joon Baek, Zhang, Lihua, Stach, Eric A, Gorte, Raymond J
Format:	Artikel
Sprache:	eng
Schlagworte:	atomic layer feposition (ALD) CaTiO3 coking resistance dry methane reforming INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY Ni catalyst steam methane reforming “intelligent” catalyst
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!