High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID)
Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided desig...
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Veröffentlicht in: | ACS applied nano materials 2018-03, Vol.1 (3), p.1028-1041 |
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creator | Fowlkes, Jason D Winkler, R Lewis, Brett B Fernández-Pacheco, A Skoric, L Sanz-Hernández, D Stanford, Michael G Mutunga, Eva Rack, P. D Plank, H |
description | Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided design (CAD) program (3BID) enabling 3D-FEBID is presented and simultaneously released for download. The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. The CAD approach supplants trial and error toward more precise/accurate FEBID required for real applications/device prototyping. |
doi_str_mv | 10.1021/acsanm.7b00342 |
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The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. The CAD approach supplants trial and error toward more precise/accurate FEBID required for real applications/device prototyping.</description><subject>3D-nanoprinting</subject><subject>additive manufacturing</subject><subject>computer-aided design</subject><subject>direct write</subject><subject>focused electron beam induced deposition</subject><subject>NANOSCIENCE AND NANOTECHNOLOGY</subject><issn>2574-0970</issn><issn>2574-0970</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNp1kL1PwzAQxS0EElXpymwxAVLKOXYazNZPWqmCBVgtx760rhq7ilOk_vcEpQML0z2d3jvd-xFyy2DIIGVP2kTtq2FeAHCRXpBemuUiAZnD5R99TQYx7gCASTbiAD3ytXSbbbJwFveuOVE-S960D4fa-cb5Df12mi6COUa0dL5H09TB0wnqKr7QaagOxwbrZNymLZ1hdBtP7_lkNXu4IVel3kccnGeffC7mH9Nlsn5_XU3H60RzwZqEZWnJtcZRIWRmJD5LhsxqyEeCc7SgM6ZLm5VaomAlFGVqMyG4MdoUmFrB--Suuxti41Q0rkGzNcH79lXFBJcyS1vTsDOZOsRYY6nafpWuT4qB-qWnOnrqTK8NPHaBdq924Vj7tsN_5h8IuXCm</recordid><startdate>20180323</startdate><enddate>20180323</enddate><creator>Fowlkes, Jason D</creator><creator>Winkler, R</creator><creator>Lewis, Brett B</creator><creator>Fernández-Pacheco, A</creator><creator>Skoric, L</creator><creator>Sanz-Hernández, D</creator><creator>Stanford, Michael G</creator><creator>Mutunga, Eva</creator><creator>Rack, P. 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subjects | 3D-nanoprinting additive manufacturing computer-aided design direct write focused electron beam induced deposition NANOSCIENCE AND NANOTECHNOLOGY |
title | High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID) |
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