Rough surface adhesion in the presence of capillary condensation
Capillary condensation of water can have a significant effect on rough surface adhesion. To explore this phenomenon between micromachined surfaces, the authors perform microcantilever experiments as a function of surface roughness and relative humidity (RH). Below a threshold RH, the adhesion is mai...
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| Veröffentlicht in: | Applied physics letters 2007-04, Vol.90 (16), p.163104-163104-3 |
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| container_end_page | 163104-3 |
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| container_issue | 16 |
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| container_title | Applied physics letters |
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| creator | DelRio, Frank W. Dunn, Martin L. Phinney, Leslie M. Bourdon, Chris J. de Boer, Maarten P. |
| description | Capillary condensation of water can have a significant effect on rough surface adhesion. To explore this phenomenon between micromachined surfaces, the authors perform microcantilever experiments as a function of surface roughness and relative humidity (RH). Below a threshold RH, the adhesion is mainly due to van der Waals forces across extensive noncontacting areas. Above the threshold RH, the adhesion jumps due to capillary condensation and increases towards the upper limit of
Γ
=
144
mJ
∕
m
2
. A detailed model based on the measured surface topography qualitatively agrees with the experimental data only when the topographic correlations between the upper and lower surfaces are considered. |
| doi_str_mv | 10.1063/1.2723658 |
| format | Article |
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Γ
=
144
mJ
∕
m
2
. A detailed model based on the measured surface topography qualitatively agrees with the experimental data only when the topographic correlations between the upper and lower surfaces are considered.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.2723658</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>United States: American Institute of Physics</publisher><subject>ENGINEERING ; INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY</subject><ispartof>Applied physics letters, 2007-04, Vol.90 (16), p.163104-163104-3</ispartof><rights>2007 American Institute of Physics</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c412t-b056a0453d1e5a1d34d014a2e3d37b7e89fac9a80b59c43b94edfeb3767aa7cd3</citedby><cites>FETCH-LOGICAL-c412t-b056a0453d1e5a1d34d014a2e3d37b7e89fac9a80b59c43b94edfeb3767aa7cd3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.2723658$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>230,314,780,784,794,885,1559,4512,27924,27925,76384,76390</link.rule.ids><backlink>$$Uhttps://www.osti.gov/servlets/purl/1426973$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>DelRio, Frank W.</creatorcontrib><creatorcontrib>Dunn, Martin L.</creatorcontrib><creatorcontrib>Phinney, Leslie M.</creatorcontrib><creatorcontrib>Bourdon, Chris J.</creatorcontrib><creatorcontrib>de Boer, Maarten P.</creatorcontrib><creatorcontrib>Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)</creatorcontrib><title>Rough surface adhesion in the presence of capillary condensation</title><title>Applied physics letters</title><description>Capillary condensation of water can have a significant effect on rough surface adhesion. To explore this phenomenon between micromachined surfaces, the authors perform microcantilever experiments as a function of surface roughness and relative humidity (RH). Below a threshold RH, the adhesion is mainly due to van der Waals forces across extensive noncontacting areas. Above the threshold RH, the adhesion jumps due to capillary condensation and increases towards the upper limit of
Γ
=
144
mJ
∕
m
2
. A detailed model based on the measured surface topography qualitatively agrees with the experimental data only when the topographic correlations between the upper and lower surfaces are considered.</description><subject>ENGINEERING</subject><subject>INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNp1kE1LxDAQhoMoWFcP_oPgzUPXTCdp2osoy_oBC4LoOaTJ1FZquzTdg__e7HavnoZhHt6ZeRi7BrEEkeMdLDOdYa6KE5aA0DpFgOKUJUIITPNSwTm7COE7tipDTNjD-7D7anjYjbV1xK1vKLRDz9ueTw3x7UiB-jgYau7stu06O_5yN_Se-mCnSF6ys9p2ga6OdcE-n9Yfq5d08_b8unrcpE5CNqWVULkVUqEHUhY8Si9A2ozQo640FWXcX9pCVKp0EqtSkq-pQp1ra7XzuGA3c-4QptYE107kmnhIT24yILO81Bih2xly4xDCSLXZju1PPNmAMHs_BszRT2TvZ3afdXjlf_ggyRwlmVkS_gEFwm0h</recordid><startdate>20070416</startdate><enddate>20070416</enddate><creator>DelRio, Frank W.</creator><creator>Dunn, Martin L.</creator><creator>Phinney, Leslie M.</creator><creator>Bourdon, Chris J.</creator><creator>de Boer, Maarten P.</creator><general>American Institute of Physics</general><general>American Institute of Physics (AIP)</general><scope>AAYXX</scope><scope>CITATION</scope><scope>OIOZB</scope><scope>OTOTI</scope></search><sort><creationdate>20070416</creationdate><title>Rough surface adhesion in the presence of capillary condensation</title><author>DelRio, Frank W. ; Dunn, Martin L. ; Phinney, Leslie M. ; Bourdon, Chris J. ; de Boer, Maarten P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c412t-b056a0453d1e5a1d34d014a2e3d37b7e89fac9a80b59c43b94edfeb3767aa7cd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>ENGINEERING</topic><topic>INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>DelRio, Frank W.</creatorcontrib><creatorcontrib>Dunn, Martin L.</creatorcontrib><creatorcontrib>Phinney, Leslie M.</creatorcontrib><creatorcontrib>Bourdon, Chris J.</creatorcontrib><creatorcontrib>de Boer, Maarten P.</creatorcontrib><creatorcontrib>Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV - Hybrid</collection><collection>OSTI.GOV</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>DelRio, Frank W.</au><au>Dunn, Martin L.</au><au>Phinney, Leslie M.</au><au>Bourdon, Chris J.</au><au>de Boer, Maarten P.</au><aucorp>Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Rough surface adhesion in the presence of capillary condensation</atitle><jtitle>Applied physics letters</jtitle><date>2007-04-16</date><risdate>2007</risdate><volume>90</volume><issue>16</issue><spage>163104</spage><epage>163104-3</epage><pages>163104-163104-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Capillary condensation of water can have a significant effect on rough surface adhesion. To explore this phenomenon between micromachined surfaces, the authors perform microcantilever experiments as a function of surface roughness and relative humidity (RH). Below a threshold RH, the adhesion is mainly due to van der Waals forces across extensive noncontacting areas. Above the threshold RH, the adhesion jumps due to capillary condensation and increases towards the upper limit of
Γ
=
144
mJ
∕
m
2
. A detailed model based on the measured surface topography qualitatively agrees with the experimental data only when the topographic correlations between the upper and lower surfaces are considered.</abstract><cop>United States</cop><pub>American Institute of Physics</pub><doi>10.1063/1.2723658</doi><oa>free_for_read</oa></addata></record> |
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| source | AIP Journals Complete; AIP Digital Archive |
| subjects | ENGINEERING INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY |
| title | Rough surface adhesion in the presence of capillary condensation |
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