Effects of temperature and surface contamination on D retention in ultrathin Li films on TZM

In this work, we investigate deuterium retention at the Mo–Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the...

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Veröffentlicht in:Journal of nuclear materials 2015-08, Vol.463 (C), p.1177-1180
Hauptverfasser: Capece, A.M., Roszell, J.P., Skinner, C.H., Koel, B.E.
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container_end_page 1180
container_issue C
container_start_page 1177
container_title Journal of nuclear materials
container_volume 463
creator Capece, A.M.
Roszell, J.P.
Skinner, C.H.
Koel, B.E.
description In this work, we investigate deuterium retention at the Mo–Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the absence of oxygen, D is retained as LiD, and the relative amount of retained D decreases with increasing substrate temperature. In three-monolayer thick lithium oxide films, the amount of D retained was 2.5 times higher than the amount retained as LiD in the metallic Li film. However, oxygen reduces the thermal stability of D in the film, causing D2O and D2 to be released from the surface at temperatures 150–200K below the LiD decomposition temperature. These results highlight the importance of maintaining a metallic Li layer for high D retention in Li films on TZM at elevated temperatures.
doi_str_mv 10.1016/j.jnucmat.2014.10.048
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subjects Deuterium
deuterium retention
Ion beams
Li thin films
Lithium
MATERIALS SCIENCE
Molybdenum
Molybdenum base alloys
Nuclear engineering
oxidation
Thick films
Thin films
title Effects of temperature and surface contamination on D retention in ultrathin Li films on TZM
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