Characterizing the Three-Dimensional Structure of Block Copolymers via Sequential Infiltration Synthesis and Scanning Transmission Electron Tomography

Understanding and controlling the three-dimensional structure of block copolymer (BCP) thin films is critical for utilizing these materials for sub-20 nm nanopatterning in semiconductor devices, as well as in membranes and solar cell applications. Combining an atomic layer deposition (ALD)-based tec...

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Veröffentlicht in:ACS nano 2015-05, Vol.9 (5), p.5333-5347
Hauptverfasser: Segal-Peretz, Tamar, Winterstein, Jonathan, Doxastakis, Manolis, Ramírez-Hernández, Abelardo, Biswas, Mahua, Ren, Jiaxing, Suh, Hyo Seon, Darling, Seth B, Liddle, J. Alexander, Elam, Jeffrey W, de Pablo, Juan J, Zaluzec, Nestor J, Nealey, Paul F
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Sprache:eng
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