Spectroscopic ellipsometry and photoluminescence measurements of as-deposited and annealed silicon rich oxynitride films

As-deposited and annealed amorphous SiO x N y /H (0.17 ≤ x ≤ 0.96; 0.07 ≤ y ≤ 0.27) films were characterized by spectroscopic ellipsometry and room temperature photoluminescence measurements. The refractive index of as-deposited silicon oxynitride films could be successfully varied between SiO 2 and...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 2008-04, Vol.516 (12), p.4342-4350
Hauptverfasser: Kohli, Sandeep, Theil, Jeremy A., McCurdy, Patrick R., Dippo, Patricia C., Ahrenkiel, Richard K., Rithner, Christopher D., Dorhout, Peter K.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!