Three-Tone Chemical Patterns for Block Copolymer Directed Self-Assembly

Chemical patterns for directed self-assembly (DSA) of lamellae-forming block copolymers (BCP) with density multiplication can be fabricated by patterning resist on a cross-linked polystyrene layer, etching to create guide stripes, and depositing end-grafted brushes in between the stripes as backgrou...

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Veröffentlicht in:	ACS applied materials & interfaces 2016-02, Vol.8 (4), p.2704-2712
Hauptverfasser:	Williamson, Lance D, Seidel, Robert N, Chen, Xuanxuan, Suh, Hyo Seon, Rincon Delgadillo, Paulina, Gronheid, Roel, Nealey, Paul F
Format:	Artikel
Sprache:	eng
Schlagworte:	block copolymer chemical pattern chemoepitaxy directed self-assembly surface modification
Online-Zugang:	Volltext
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