Effect of surface passivation on dopant distribution in Si quantum dots: The case of B and P doping

Despite many efforts, the doping behavior in Si quantum dots (QDs) is still not well understood. Theoretical work shows that boron as an acceptor prefers to stay near the surface and phosphorous as a donor may stay close to the center in a perfectly hydrogen passivated QD. However, experiment studie...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2011-04, Vol.98 (17), p.173103-173103-3
Hauptverfasser: Ma, Jie, Wei, Su-Huai, Neale, Nathan R., Nozik, Arthur J.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!