Substrate and coating defect planarization strategies for high-laser-fluence multilayer mirrors

Planarizing or smoothing over nodular defects in multilayer mirrors can be accomplished by a discrete deposit-and-etch process that exploits the angle-dependent etching rate of optical materials. Typically, nodular defects limit the fluence on mirrors irradiated at 1064nm with 10ns pulse lengths due...

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Veröffentlicht in:	Thin solid films 2015-10, Vol.592 (PB), p.216-220
Hauptverfasser:	Stolz, Christopher J., Wolfe, Justin E., Mirkarimi, Paul B., Folta, James A., Adams, John J., Menor, Marlon G., Teslich, Nick E., Soufli, Regina, Menoni, Carmen S., Patel, Dinesh
Format:	Artikel
Sprache:	eng
Schlagworte:	1064-nm laser Defects Deposition Etching Ion beam sputtering Laser damage testing Lasers Multilayer mirror Multilayers Nanosecond pulse length Nodular defect Planarization Silicon dioxide Strategy Thin film
Online-Zugang:	Volltext
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