Poly(dimethylsiloxane‑b‑methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning
We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using c...
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| Veröffentlicht in: | Macromolecules 2015-06, Vol.48 (11), p.3422-3430 |
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| container_title | Macromolecules |
| container_volume | 48 |
| creator | Luo, Yingdong Montarnal, Damien Kim, Sangwon Shi, Weichao Barteau, Katherine P Pester, Christian W Hustad, Phillip D Christianson, Matthew D Fredrickson, Glenn H Kramer, Edward J Hawker, Craig J |
| description | We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ∼ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ∼ 0.1 at 150 °C). Performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials. |
| doi_str_mv | 10.1021/acs.macromol.5b00518 |
| format | Article |
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A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ∼ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ∼ 0.1 at 150 °C). 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A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ∼ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ∼ 0.1 at 150 °C). 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A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ∼ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ∼ 0.1 at 150 °C). Performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials.</abstract><cop>United States</cop><pub>American Chemical Society</pub><doi>10.1021/acs.macromol.5b00518</doi><tpages>9</tpages><orcidid>https://orcid.org/0000-0003-3246-3467</orcidid><oa>free_for_read</oa></addata></record> |
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| subjects | Chemical Sciences MATERIALS SCIENCE morphology organic compounds Polymers solvents thin films X-ray scattering |
| title | Poly(dimethylsiloxane‑b‑methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning |
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