Al-doped ZnO as a switching layer for transparent bipolar resistive switching memory

In this report, we employ an Al-doped ZnO (AZO) layer as a resistive switching layer for transparent resistive switching random access memory devices. An Indium-Tin-Oxide (ITO)/AZO/ITO/glass device exhibits a transmittance of ∼80% (including a glass substrate) in the visible wavelength region and de...

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Veröffentlicht in:Electronic materials letters 2014, 10(2), , pp.321-324
Hauptverfasser: Yu, Hyeongwoo, Kim, Minho, Kim, Yoonsu, Lee, Jeongsup, Kim, Kyoung-Kook, Choi, Sang-Jun, Cho, Soohaeng
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Sprache:eng
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Zusammenfassung:In this report, we employ an Al-doped ZnO (AZO) layer as a resistive switching layer for transparent resistive switching random access memory devices. An Indium-Tin-Oxide (ITO)/AZO/ITO/glass device exhibits a transmittance of ∼80% (including a glass substrate) in the visible wavelength region and demonstrates reliable bipolar resistive switching behavior over d.c. 300 sweeping cycles with a low operation voltage and a very low variation in the switching threshold voltage. These results indicate that the AZO film is a promising transparent resistive switching layer.
ISSN:1738-8090
2093-6788
DOI:10.1007/s13391-013-3225-9