Flexible NiO nanocrystal-based resistive memory device fabricated by lowtemperature solution-process

In this study, a nickel oxide (NiO) nanocrystal (NC) based flexible resistive memory device is demonstrated at temperature as low as 180 °C by ligand exchange process. The fabricated device for flexible application with structure Ni/NiO/Ni on PI substrate exhibits excellent switching characteristics...

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Veröffentlicht in:Current applied physics 2020, 20(2), , pp.288-292
Hauptverfasser: Hye-Won Yun, Ho Kun Woo, Soong Ju Oh, Sung-Hoon Hong
Format: Artikel
Sprache:eng
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Zusammenfassung:In this study, a nickel oxide (NiO) nanocrystal (NC) based flexible resistive memory device is demonstrated at temperature as low as 180 °C by ligand exchange process. The fabricated device for flexible application with structure Ni/NiO/Ni on PI substrate exhibits excellent switching characteristics with low set/reset voltages and stable resistance values in both ON and OFF states for over 100 switching cycles of memory operation. Also, this flexible memory device shows stable resistive switching properties under compressive stress with bending radius to 10 mm and consecutive bending cycles. The ReRAM fabricated by a low-temperature solution-process shows potential for next generation flexible electronics. KCI Citation Count: 0
ISSN:1567-1739
1878-1675