분말소재의 표면처리를 위한 회전형 CVD 공정

This paper reviews the potentials of a rotary chemical vapor deposition (RCVD) process for nanomaterial synthesis and coating on powder-based materials. The rotary reactor offers a significant improvement over traditional CVD methods having horizontal and fixed reaction chambers. The RCVD system yie...

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Veröffentlicht in:Biuletyn Uniejowski 2023, 56(6), , pp.341-352
Hauptverfasser: 이종환(Jong-Hwan Lee), 정구환(Goo-Hwan Jeong)
Format: Artikel
Sprache:kor
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Zusammenfassung:This paper reviews the potentials of a rotary chemical vapor deposition (RCVD) process for nanomaterial synthesis and coating on powder-based materials. The rotary reactor offers a significant improvement over traditional CVD methods having horizontal and fixed reaction chambers. The RCVD system yields enhanced productivity and surface coating uniformity of nanoparticles applied in various purposes, such as efficient heat dissipation, surface hardness enhancement, and enhanced energy storage performances. The effectiveness of the RCVD system would open up new possibilities in various applications because uniform coating on powder-based materials with massive productivity is inevitable to develop multi-functional materials with high reliability.
ISSN:1225-8024
2299-8403
2288-8403