Beam masking to reduce cyclic error in beam launcher of interferometer

Embodiments of the present invention are directed to reducing cyclic error in the beam launcher of an interferometer. In one embodiment, an interferometry apparatus comprises a reference beam directed along a reference path, and a measurement beam spatially separated from the reference beam and being directed along a measurement path contacting a measurement object. The reference beam and the measurement beam have a single frequency. At least a portion of the reference beam and at least a portion of the measurement beam overlapping along a common path. One or more masks are disposed in the common path or in the reference path and the measurement path to spatially isolate the reference beam and the measurement beam from one another.