Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

The interaction of EUV light with matter is a critical step in EUV lithographic processes and optimization of the optical material parameters of photoresists and reflector/absorber stacks is crucial to harness the full power of EUV lithography. To optimize these materials, accurate measurements of E...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Dorney, Kevin M, Kissoon, Nicola N, Holzmeier, Fabian, Larsen, Esben W, Singh, Dhirendra P, Arvind, Shikhar, Santra, Sayantani, Fallica, Roberto, Makhotkin, Igor, Philipsen, Vicky, Gendt, Stefan De, Fleischmann, Claudia, Heide, Paul A.W. van der, Petersen, John S
Format:	Tagungsbericht
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!