Observation of thermally activated glassiness and memory dip in a-NbSi insulating thin films

We present electrical conductance measurements on amorphous NbSi insulating thin films. These films display out-of equilibrium electronic features that are markedly different from what has been reported so far in disordered insulators. Like in the most studied systems (indium oxide and granular Al f...

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Veröffentlicht in:Europhysics letters 2014-06, Vol.106 (6), p.67006, Article 67006
Hauptverfasser: Delahaye, J., Grenet, T., Marrache-Kikuchi, C. A., Drillien, A. A., Bergé, L.
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container_issue 6
container_start_page 67006
container_title Europhysics letters
container_volume 106
creator Delahaye, J.
Grenet, T.
Marrache-Kikuchi, C. A.
Drillien, A. A.
Bergé, L.
description We present electrical conductance measurements on amorphous NbSi insulating thin films. These films display out-of equilibrium electronic features that are markedly different from what has been reported so far in disordered insulators. Like in the most studied systems (indium oxide and granular Al films), a slow relaxation of the conductance is observed after a quench to liquid-helium temperature which gives rise to the growth of a memory dip in MOSFET devices. But unlike in these systems, this memory dip and the related conductance relaxations are still visible up to room temperature, with clear signatures of a temperature-dependent dynamics.
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subjects 72.20.Ee
72.80.Ng
73.40.Qv
Condensed Matter
Disordered Systems and Neural Networks
Indium oxides
Insulators
Memory devices
Physics
Room temperature
Temperature dependence
Thin films
title Observation of thermally activated glassiness and memory dip in a-NbSi insulating thin films
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