Observation of thermally activated glassiness and memory dip in a-NbSi insulating thin films
We present electrical conductance measurements on amorphous NbSi insulating thin films. These films display out-of equilibrium electronic features that are markedly different from what has been reported so far in disordered insulators. Like in the most studied systems (indium oxide and granular Al f...
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Veröffentlicht in: | Europhysics letters 2014-06, Vol.106 (6), p.67006, Article 67006 |
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creator | Delahaye, J. Grenet, T. Marrache-Kikuchi, C. A. Drillien, A. A. Bergé, L. |
description | We present electrical conductance measurements on amorphous NbSi insulating thin films. These films display out-of equilibrium electronic features that are markedly different from what has been reported so far in disordered insulators. Like in the most studied systems (indium oxide and granular Al films), a slow relaxation of the conductance is observed after a quench to liquid-helium temperature which gives rise to the growth of a memory dip in MOSFET devices. But unlike in these systems, this memory dip and the related conductance relaxations are still visible up to room temperature, with clear signatures of a temperature-dependent dynamics. |
doi_str_mv | 10.1209/0295-5075/106/67006 |
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A. ; Drillien, A. A. ; Bergé, L.</creator><creatorcontrib>Delahaye, J. ; Grenet, T. ; Marrache-Kikuchi, C. A. ; Drillien, A. A. ; Bergé, L.</creatorcontrib><description>We present electrical conductance measurements on amorphous NbSi insulating thin films. These films display out-of equilibrium electronic features that are markedly different from what has been reported so far in disordered insulators. Like in the most studied systems (indium oxide and granular Al films), a slow relaxation of the conductance is observed after a quench to liquid-helium temperature which gives rise to the growth of a memory dip in MOSFET devices. 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A.</creatorcontrib><creatorcontrib>Drillien, A. A.</creatorcontrib><creatorcontrib>Bergé, L.</creatorcontrib><title>Observation of thermally activated glassiness and memory dip in a-NbSi insulating thin films</title><title>Europhysics letters</title><addtitle>EPL</addtitle><addtitle>EPL</addtitle><description>We present electrical conductance measurements on amorphous NbSi insulating thin films. These films display out-of equilibrium electronic features that are markedly different from what has been reported so far in disordered insulators. Like in the most studied systems (indium oxide and granular Al films), a slow relaxation of the conductance is observed after a quench to liquid-helium temperature which gives rise to the growth of a memory dip in MOSFET devices. But unlike in these systems, this memory dip and the related conductance relaxations are still visible up to room temperature, with clear signatures of a temperature-dependent dynamics.</description><subject>72.20.Ee</subject><subject>72.80.Ng</subject><subject>73.40.Qv</subject><subject>Condensed Matter</subject><subject>Disordered Systems and Neural Networks</subject><subject>Indium oxides</subject><subject>Insulators</subject><subject>Memory devices</subject><subject>Physics</subject><subject>Room temperature</subject><subject>Temperature dependence</subject><subject>Thin films</subject><issn>0295-5075</issn><issn>1286-4854</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNqFkN1rFDEUxYMouLb-Bb4EfBAfxr3JTD7msSxqhbVFq-iDEG5nkjY182EyW9z_3kynrCCiTwmH3zn33kPIMwavGId6DbwWhQAl1gzkWioA-YCsGNeyqLSoHpLVgXhMnqR0A8CYZnJFvp1fJhtvcfJDTwdHp2sbOwxhT7GZfNZtS68CpuR7mxLFvqWd7Ya4p60fqe8pFmeXFz7_0i7klP4qR2TZ-dClY_LIYUj26f17RD6_ef1pc1psz9--25xsi6aScioaUTa1AqE4E8rVGqUFZ5lGjapF1BJ0JSuuaqVcBQKbmrHKlpbz1rVWV-URebnkXmMwY_Qdxr0Z0JvTk62ZNWDARM3kLcvs84Ud4_BjZ9NkboZd7PN6pmQZA5UbzVS5UE0cUorWHWIZmLlyMxdq5kKzIs1d5dlV_-Fq_HRX7RTRh_94i8Xr02R_HsZh_J6BMqMavpj3_OvHD3xzYeab1_f8MP4-4d8TXvzFYcewMAtlxtaVvwDAVa58</recordid><startdate>20140601</startdate><enddate>20140601</enddate><creator>Delahaye, J.</creator><creator>Grenet, T.</creator><creator>Marrache-Kikuchi, C. 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A.</au><au>Bergé, L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Observation of thermally activated glassiness and memory dip in a-NbSi insulating thin films</atitle><jtitle>Europhysics letters</jtitle><stitle>EPL</stitle><addtitle>EPL</addtitle><date>2014-06-01</date><risdate>2014</risdate><volume>106</volume><issue>6</issue><spage>67006</spage><pages>67006-</pages><artnum>67006</artnum><issn>0295-5075</issn><eissn>1286-4854</eissn><coden>EULEEJ</coden><abstract>We present electrical conductance measurements on amorphous NbSi insulating thin films. These films display out-of equilibrium electronic features that are markedly different from what has been reported so far in disordered insulators. Like in the most studied systems (indium oxide and granular Al films), a slow relaxation of the conductance is observed after a quench to liquid-helium temperature which gives rise to the growth of a memory dip in MOSFET devices. 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subjects | 72.20.Ee 72.80.Ng 73.40.Qv Condensed Matter Disordered Systems and Neural Networks Indium oxides Insulators Memory devices Physics Room temperature Temperature dependence Thin films |
title | Observation of thermally activated glassiness and memory dip in a-NbSi insulating thin films |
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