Investigation of CF3I as an Environmentally Benign Dielectric Etchant

In this study, trifluoroiodomethane (CF3I), a non-global-warming gas, has been investigated as a substitute for typical PFC's currently used in wafer patterning and CVD chamber cleaning processes. Dielectric films consisting of plasma enhanced chemically vapor deposited silicon dioxide and sili...

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Veröffentlicht in:	Journal of materials research 1998-09, Vol.13 (9), p.2643-2648
Hauptverfasser:	Levy, R. A., Zaitsev, V. B., Aryusook, K., Ravindranath, C., Sigal, V., Misra, A., Kesari, S., Rufin, D., Sees, J., Hall, L.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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