SF6-Based Deep Reactive Ion Etching of (001) Rutile TiO2 Substrate for Photonic Crystal Structure with Wide Complete Photonic Band Gap

We demonstrated the fabrication of a photonic crystal structure of a (001) rutile TiO 2 substrate by deep reactive ion etching (RIE) using SF 6 plasma. A vertical etching profile and a smooth etched surface, which satisfy the requirements for optical device application, were obtained. We think that...

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Veröffentlicht in:	Jpn J Appl Phys 2012-09, Vol.51 (9), p.098002-098002-2
Hauptverfasser:	Matsutani, Akihiro, Hayashi, Mikiro, Morii, Yasushi, Nishioka, Kunio, Isobe, Toshihiro, Nakajima, Akira, Matsushita, Sachiko
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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