Formation of Cobalt and Cobalt-Silicide Nanodots on Ultrathin SiO2 Induced by Remote Hydrogen Plasma
High-density Co nanodots with an areal dot density as high as $2.6 \times 10^{11}$ cm -2 were formed on thermally grown SiO 2 by exposing a ${\sim}1.2$-nm-thick Co layer to a remote H 2 plasma without external heating. Also, Co-silicide nanodots on SiO 2 were fabricated by silicidation of pregrown S...
Gespeichert in:
| Veröffentlicht in: | Jpn J Appl Phys 2010-08, Vol.49 (8), p.08JA04-08JA04-4 |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng ; jpn |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!