High-Rate Growth of High-Crystallinity LiCoO2 Epitaxial Thin Films by Pulsed Laser Deposition
Pulsed laser deposition is widely used to form complex oxide thin films due to the relatively small deviation in composition between the target and the film. The deviation, although small, is not completely prevented: it highly depends on the ablation conditions. Furthermore, gas pressure affects it...
Gespeichert in:
Veröffentlicht in: | Applied physics express 2012-05, Vol.5 (5), p.055502-055502-3 |
---|---|
Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!