Surface-tension-tailored aqueous ink for low-temperature deposition of high-k HfO2 thin film

In this paper, solution-based deposition of HfO2 thin film at low temperature was demonstrated. By using aqueous HfCl4 solution, the precursor was effectively decomposed with low annealing temperature of 150 °C. Thus it is preferable to use this solution for dielectric coating on flexible substrates...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2016-08, Vol.55 (8)
Hauptverfasser:	Han, Sun Woong, Lee, Keun Ho, Yoo, Young Bum, Park, Jee Ho, Song, Kie Moon, Baik, Hong Koo
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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