Investigation of large-area multicoil inductively coupled plasma sources using three-dimensional fluid model

A multi inductively coupled plasma (ICP) system can be used to maintain the plasma uniformity and increase the area processed by a high-density plasma. This article presents a source in two different configurations. The distributed planar multi ICP (DM-ICP) source comprises individual ICP sources th...

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Veröffentlicht in:Japanese Journal of Applied Physics 2016-07, Vol.55 (7S2), p.7-07LD08
1. Verfasser: Brcka, Jozef
Format: Artikel
Sprache:eng
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