Effects of sputtering gas pressure on physical properties of ferroelectric (Bi3.25Nd0.65Eu0.10)Ti3O12 nanoplate films

(Bi3.25Nd0.65Eu0.10)Ti3O12 (BNEuT-0.1) films with a- and b-axis orientations and thicknesses of 1.8-2.3 µm were sputter-deposited on conductive Nb:TiO2(101) substrates containing 0.79 mass % Nb. The deposition temperature was fixed at 650 °C, and the sputtering gas pressure was varied from 0.4 to 5....

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Japanese Journal of Applied Physics 2015-10, Vol.54 (10S)
Hauptverfasser:	Kobune, Masafumi, Kuriyama, Tomoyuki, Furotani, Ryosuke, Kugimiya, Takuya, Ueshima, Satoshi, Kikuchi, Takeyuki, Fujisawa, Hironori, Nakashima, Seiji, Shimizu, Masaru, Fukumuro, Naoki
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!