Selective etch of poly(methyl methacrylate) in block copolymer based on control of ion energy and design of gas chemistry for directed self assembly lithography

The selective etching of poly(methyl methacrylate) (PMMA) in a block copolymer was studied with a focus on the material structures of polystyrene (PS) and PMMA. Based on our predictions, we investigated the effect of ion bombardment and designed a carbon-containing gas plasma to improve selectivity....

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Veröffentlicht in:	Japanese Journal of Applied Physics 2014-03, Vol.53 (3S2), p.3-1-03DD03-4
Hauptverfasser:	Yamamoto, Hiroshi, Imamura, Tsubasa, Omura, Mitsuhiro, Sakai, Itsuko, Hayashi, Hisataka
Format:	Artikel
Sprache:	eng
Schlagworte:	Assembly Block copolymers Carbon Etching Gas plasmas Lithography Polymethyl methacrylates Polystyrene resins Self assembly
Online-Zugang:	Volltext
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