Effects of sputtered buffer layer on the characteristics of ZnO:Al films grown on glass substrates using high-temperature H2O generated by a catalytic reaction

The improvement in the quality of ZnO:Al films grown on glass substrates was investigated using a sputtered buffer layer inserted between a glass substrate and a ZnO:Al CVD film. ZnO:Al layers were grown at 773 K using dimethylzinc (DMZn), trimethylaluminum (TMAl), and high-temperature H2O generated...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2014-01, Vol.53 (2S)
Hauptverfasser:	Nishiyama, Tomoya, Takezawa, Kazuki, Nakazawa, Yuta, Oyanagi, Takahiro, Kato, Takahiro, Oishi, Koichiro, Nakamura, Susumu, Yasui, Kanji
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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