Annihilation mechanism of V-shaped pits in c-GaN grown by hydride vapor-phase epitaxy

Annihilation mechanism of V-shaped pits in c-GaN grown by hydride vapor-phase epitaxy

An evident issue in performing GaN growth along the c-direction is the generation of V-shaped pits on its surface. Here, we investigated the transition of the angle of facets forming a V-shaped pit via three-photon excitation photoluminescence (3PPL). The intermittent doping of Ge was introduced to...

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Veröffentlicht in:Japanese Journal of Applied Physics 2019-06, Vol.58 (SC), p.SC1011
Hauptverfasser: Iso, Kenji, Ikeda, Hirotaka, Gouda, Riki, Mochizuki, Tae, Izumisawa, Satoru
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Sprache:eng
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Carrier gases
Epitaxial growth
Photoluminescence
Pits
Vapor phase epitaxy
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container_issue SC
container_start_page SC1011
container_title Japanese Journal of Applied Physics
container_volume 58
creator Iso, Kenji
Ikeda, Hirotaka
Gouda, Riki
Mochizuki, Tae
Izumisawa, Satoru
description An evident issue in performing GaN growth along the c-direction is the generation of V-shaped pits on its surface. Here, we investigated the transition of the angle of facets forming a V-shaped pit via three-photon excitation photoluminescence (3PPL). The intermittent doping of Ge was introduced to GaN growth to observe the growth front. The size of the V-shaped pit composed of { 10 1 ¯ 2 } facets decreased along the growth direction, whereas that composed of { 10 1 ¯ 1 } facets, increased. Furthermore, planar growths of c-GaN and semipolar GaN having various surface orientations revealed that the V-shaped pit composed of { 10 1 ¯ 2 } was likely to annihilate rather than that of { 10 1 ¯ 1 } under the growth condition of N2 carrier gas, which coincides with the result of 3PPL.
doi_str_mv 10.7567/1347-4065/ab0402
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subjects Carrier gases
Epitaxial growth
Photoluminescence
Pits
Vapor phase epitaxy
title Annihilation mechanism of V-shaped pits in c-GaN grown by hydride vapor-phase epitaxy
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