Thermodynamic constraints and substrate influences on the growth of high-quality Bi2Te3 thin films by pulsed laser deposition

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Veröffentlicht in:Applied physics express 2022-05, Vol.15 (6)
Hauptverfasser: Tanaka, Yusuke, Krockenberger, Yoshiharu, Kunihashi, Yoji, Sanada, Haruki, Omi, Hiroo, Gotoh, Hideki, Oguri, Katsuya
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container_issue 6
container_start_page
container_title Applied physics express
container_volume 15
creator Tanaka, Yusuke
Krockenberger, Yoshiharu
Kunihashi, Yoji
Sanada, Haruki
Omi, Hiroo
Gotoh, Hideki
Oguri, Katsuya
description
doi_str_mv 10.35848/1882-0786/ac6e27
format Article
fullrecord <record><control><sourceid>iop</sourceid><recordid>TN_cdi_iop_journals_10_35848_1882_0786_ac6e27</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>apexac6e27</sourcerecordid><originalsourceid>FETCH-LOGICAL-i2507-f06bdd6cd7645b9d97cbc8607c58451d5d472c06f2778f244837e8d909036ce63</originalsourceid><addsrcrecordid>eNptkDtPwzAUhS0EEqXwA9juyBLqOPEjI1S8pEosZbYcPxpXqR3iRNCB_04KqBPTfR3do_MhdJ3j24KKUixyIUiGuWALpZkl_ATNjqvTY8_FObpIaYsxK4uczdDXurH9Lpp9UDuvQceQhl75MCRQwUAa68M8WPDBtaMN2iaIAYbGwqaPH0MD0UHjN032PqrWD3u492Rti0nhAzjf7hLUe-jGNlkDrUq2B2O7mPzgY7hEZ05Nl6u_Okdvjw_r5XO2en16Wd6tMk8o5pnDrDaGacNZSevKVFzXWjDM9RSd5oaakhONmSNTQEfKUhTcClPhChdMW1bMUfb718dObuPYh8lN5lj-sJMHOPIASv6ym_Q3_-hVZz9lTiWTmFGKieyMK74BFMlyPA</addsrcrecordid><sourcetype>Enrichment Source</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Thermodynamic constraints and substrate influences on the growth of high-quality Bi2Te3 thin films by pulsed laser deposition</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Tanaka, Yusuke ; Krockenberger, Yoshiharu ; Kunihashi, Yoji ; Sanada, Haruki ; Omi, Hiroo ; Gotoh, Hideki ; Oguri, Katsuya</creator><creatorcontrib>Tanaka, Yusuke ; Krockenberger, Yoshiharu ; Kunihashi, Yoji ; Sanada, Haruki ; Omi, Hiroo ; Gotoh, Hideki ; Oguri, Katsuya</creatorcontrib><identifier>ISSN: 1882-0778</identifier><identifier>EISSN: 1882-0786</identifier><identifier>DOI: 10.35848/1882-0786/ac6e27</identifier><identifier>CODEN: APEPC4</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>pulsed laser deposition ; thermoelectric material ; thin film ; topological insulator ; van der Waals material</subject><ispartof>Applied physics express, 2022-05, Vol.15 (6)</ispartof><rights>2022 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.35848/1882-0786/ac6e27/pdf$$EPDF$$P50$$Giop$$Hfree_for_read</linktopdf><link.rule.ids>315,781,785,27929,27930,53851,53898</link.rule.ids></links><search><creatorcontrib>Tanaka, Yusuke</creatorcontrib><creatorcontrib>Krockenberger, Yoshiharu</creatorcontrib><creatorcontrib>Kunihashi, Yoji</creatorcontrib><creatorcontrib>Sanada, Haruki</creatorcontrib><creatorcontrib>Omi, Hiroo</creatorcontrib><creatorcontrib>Gotoh, Hideki</creatorcontrib><creatorcontrib>Oguri, Katsuya</creatorcontrib><title>Thermodynamic constraints and substrate influences on the growth of high-quality Bi2Te3 thin films by pulsed laser deposition</title><title>Applied physics express</title><addtitle>Appl. Phys. Express</addtitle><subject>pulsed laser deposition</subject><subject>thermoelectric material</subject><subject>thin film</subject><subject>topological insulator</subject><subject>van der Waals material</subject><issn>1882-0778</issn><issn>1882-0786</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><sourceid>O3W</sourceid><recordid>eNptkDtPwzAUhS0EEqXwA9juyBLqOPEjI1S8pEosZbYcPxpXqR3iRNCB_04KqBPTfR3do_MhdJ3j24KKUixyIUiGuWALpZkl_ATNjqvTY8_FObpIaYsxK4uczdDXurH9Lpp9UDuvQceQhl75MCRQwUAa68M8WPDBtaMN2iaIAYbGwqaPH0MD0UHjN032PqrWD3u492Rti0nhAzjf7hLUe-jGNlkDrUq2B2O7mPzgY7hEZ05Nl6u_Okdvjw_r5XO2en16Wd6tMk8o5pnDrDaGacNZSevKVFzXWjDM9RSd5oaakhONmSNTQEfKUhTcClPhChdMW1bMUfb718dObuPYh8lN5lj-sJMHOPIASv6ym_Q3_-hVZz9lTiWTmFGKieyMK74BFMlyPA</recordid><startdate>20220523</startdate><enddate>20220523</enddate><creator>Tanaka, Yusuke</creator><creator>Krockenberger, Yoshiharu</creator><creator>Kunihashi, Yoji</creator><creator>Sanada, Haruki</creator><creator>Omi, Hiroo</creator><creator>Gotoh, Hideki</creator><creator>Oguri, Katsuya</creator><general>IOP Publishing</general><scope>O3W</scope><scope>TSCCA</scope></search><sort><creationdate>20220523</creationdate><title>Thermodynamic constraints and substrate influences on the growth of high-quality Bi2Te3 thin films by pulsed laser deposition</title><author>Tanaka, Yusuke ; Krockenberger, Yoshiharu ; Kunihashi, Yoji ; Sanada, Haruki ; Omi, Hiroo ; Gotoh, Hideki ; Oguri, Katsuya</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i2507-f06bdd6cd7645b9d97cbc8607c58451d5d472c06f2778f244837e8d909036ce63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>pulsed laser deposition</topic><topic>thermoelectric material</topic><topic>thin film</topic><topic>topological insulator</topic><topic>van der Waals material</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tanaka, Yusuke</creatorcontrib><creatorcontrib>Krockenberger, Yoshiharu</creatorcontrib><creatorcontrib>Kunihashi, Yoji</creatorcontrib><creatorcontrib>Sanada, Haruki</creatorcontrib><creatorcontrib>Omi, Hiroo</creatorcontrib><creatorcontrib>Gotoh, Hideki</creatorcontrib><creatorcontrib>Oguri, Katsuya</creatorcontrib><collection>Institute of Physics Open Access Journal Titles</collection><collection>IOPscience (Open Access)</collection><jtitle>Applied physics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tanaka, Yusuke</au><au>Krockenberger, Yoshiharu</au><au>Kunihashi, Yoji</au><au>Sanada, Haruki</au><au>Omi, Hiroo</au><au>Gotoh, Hideki</au><au>Oguri, Katsuya</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Thermodynamic constraints and substrate influences on the growth of high-quality Bi2Te3 thin films by pulsed laser deposition</atitle><jtitle>Applied physics express</jtitle><addtitle>Appl. Phys. Express</addtitle><date>2022-05-23</date><risdate>2022</risdate><volume>15</volume><issue>6</issue><issn>1882-0778</issn><eissn>1882-0786</eissn><coden>APEPC4</coden><pub>IOP Publishing</pub><doi>10.35848/1882-0786/ac6e27</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record>
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects pulsed laser deposition
thermoelectric material
thin film
topological insulator
van der Waals material
title Thermodynamic constraints and substrate influences on the growth of high-quality Bi2Te3 thin films by pulsed laser deposition
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-16T10%3A43%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Thermodynamic%20constraints%20and%20substrate%20influences%20on%20the%20growth%20of%20high-quality%20Bi2Te3%20thin%20films%20by%20pulsed%20laser%20deposition&rft.jtitle=Applied%20physics%20express&rft.au=Tanaka,%20Yusuke&rft.date=2022-05-23&rft.volume=15&rft.issue=6&rft.issn=1882-0778&rft.eissn=1882-0786&rft.coden=APEPC4&rft_id=info:doi/10.35848/1882-0786/ac6e27&rft_dat=%3Ciop%3Eapexac6e27%3C/iop%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true