Novel liquid cobalt precursor for metal atomic layer deposition

A novel liquid cobalt (Co) precursor, bis (diisopropylbutanamidinate)cobalt (DIPRoBA-Co), is proposed as the liquid Co precursor for metal atomic layer deposition (ALD). This precursor was synthesized and the Co ALD process using the obtained precursor was examined. This precursor is liquid and succ...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Japanese Journal of Applied Physics 2023-07, Vol.62 (SH), p.SH8002
Hauptverfasser:	Numasawa, Yohichiroh, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Hasegawa, Yosiharu, Lee, Hyunju, Ohshita, Yoshio
Format:	Artikel
Sprache:	eng
Schlagworte:	Ammonia Atomic layer epitaxy Clausius–Clapeyron equation Co atomic layer deposition Cobalt cobalt precursor synthesis liquid Co precursor LSI metallization Precursors Silicon dioxide Silicon substrates step coverage
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!