Annealing effects on epitaxial (K,Na)NbO3 thin films grown on Si substrates

Epitaxial (K,Na)NbO3 (KNN) thin films were deposited on (001)SrRuO3/Pt/ZrO2/Si substrates by RF magnetron sputtering, and post-annealing effects on the as-deposited epitaxial KNN thin films were investigated. According to the findings, by annealing, the crystal system of these thin films changes fro...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2022-11, Vol.61 (SN), p.SN1020
Hauptverfasser:	Tanaka, Kiyotaka, Ogawa, Rei, Kweon, Sang Hyo, Tan, Goon, Kanno, Isaku
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Asymmetry Electric fields epitaxial Epitaxial growth Hysteresis loops lead-free Magnetron sputtering Na)NbO Niobates piezoelectric Piezoelectricity Polarization Residual stress Silicon substrates thin film Thin films Zirconium dioxide
Online-Zugang:	Volltext
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