Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection

Atomic layer deposition of Y2O3 thin films has been examined by multiple injections of tris-isopropylcyclopentadienyl yttrium [Y(iPrCp)3] precursors followed by remote oxygen plasma. By boosting or pressurizing the precursor cylinder higher than the chamber pressure, one can effectively deliver the...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2020-07, Vol.59 (SM)
Hauptverfasser:	Song, Jinhan, Lin, Y., Hoshii, T., Wakabayashi, H., Tsutsui, K., Kakushima, K.
Format:	Artikel
Sprache:	eng
Schlagworte:	Ar boost Atomic layer deposition Multi-shot PrCp
Online-Zugang:	Volltext
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