Effect of Atmospheric Pressure Plasma Treatment on the Charging Behavior of ITO and Fto Surfaces

Over the past two decades, many different cold atmospheric pressure plasmas (CAPP) sources have been developed in research labs and brought to industrial use. Due to their versatility, CAPPs are now employed in a wide range of applications, including water or exhaust gas purification [1], sterilizat...

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Veröffentlicht in:	Meeting abstracts (Electrochemical Society) 2024-08, Vol.MA2024-01 (24), p.1401-1401
Hauptverfasser:	Kelar, Jakub, Destrieux, Alex, Svandova, Lucia, Laroche, Gaétan, Profili, Jacopo
Format:	Artikel
Sprache:	eng
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