Electrodeposition of Photoactive Silicon Films for Low-Cost Solar Cells
Here we demonstrate progress on electrodeposition of photoactive silicon films from an environmentally friendly molten CaCl2 electrolyte, which is the first step of a new route to a practical low-cost silicon solar cell. We report electrodeposition of several-micron thick silicon films on a graphite...
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Veröffentlicht in: | Journal of the Electrochemical Society 2016-01, Vol.163 (9), p.D506-D514 |
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container_title | Journal of the Electrochemical Society |
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creator | Zhao, Ji Yin, Huayi Lim, Taeho Xie, Hongwei Hsu, Hsien-Yi Forouzan, Fardad Bard, Allen J. |
description | Here we demonstrate progress on electrodeposition of photoactive silicon films from an environmentally friendly molten CaCl2 electrolyte, which is the first step of a new route to a practical low-cost silicon solar cell. We report electrodeposition of several-micron thick silicon films on a graphite substrate in a bath of molten CaCl2 containing SiO2 nanoparticles. The best silicon deposits was obtained at 6 mA/cm2 for 1 hour in molten CaCl2 containing 0.3 M SiO2 nanoparticles, at 850°C. The main impurities are Al, Mg, Ca, Na. A photoelectrochemical method was demonstrated as a reliable and sensitive measurement for testing the quality of the silicon film. The as-deposited film exhibits 31% of the photocurrent response of a commercial p-type wafer. A comparison of graphite and silver substrates is presented, and the remaining problems are discussed. |
doi_str_mv | 10.1149/2.0731609jes |
format | Article |
fullrecord | <record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_iop_journals_10_1149_2_0731609jes</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>0731609JES</sourcerecordid><originalsourceid>FETCH-LOGICAL-c404t-bf8346bd8105be2ed26f9f87c4656986d77acf9684dd03f90efa2df3245431523</originalsourceid><addsrcrecordid>eNptkE1LAzEYhIMouFZv_oAcPbg1b5LNbo6ytFUoKFTPyzYfmCXtW5JV8d-7UsGLp2GGh2EYQq6BzQGkvuNzVgtQTA8un5ACtKzKGgBOScEYiFKqCs7JRc7DZKGRdUFWi-jMmNC6A-YwBtxT9PT5DUfszRg-HN2EGMwUL0PcZeox0TV-li3mkW4w9om2LsZ8Sc58H7O7-tUZeV0uXtqHcv20emzv16WRTI7l1jdCqq1tgFVbx53lymvf1GaapnSjbF33xmvVSGuZ8Jo533PrBZeVFFBxMSO3x16TMOfkfHdIYdenrw5Y93NCx7u_Eyb85ogHPHQDvqf9NO5_9BsuD1xa</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Electrodeposition of Photoactive Silicon Films for Low-Cost Solar Cells</title><source>IOP Publishing Journals</source><creator>Zhao, Ji ; Yin, Huayi ; Lim, Taeho ; Xie, Hongwei ; Hsu, Hsien-Yi ; Forouzan, Fardad ; Bard, Allen J.</creator><creatorcontrib>Zhao, Ji ; Yin, Huayi ; Lim, Taeho ; Xie, Hongwei ; Hsu, Hsien-Yi ; Forouzan, Fardad ; Bard, Allen J.</creatorcontrib><description>Here we demonstrate progress on electrodeposition of photoactive silicon films from an environmentally friendly molten CaCl2 electrolyte, which is the first step of a new route to a practical low-cost silicon solar cell. We report electrodeposition of several-micron thick silicon films on a graphite substrate in a bath of molten CaCl2 containing SiO2 nanoparticles. The best silicon deposits was obtained at 6 mA/cm2 for 1 hour in molten CaCl2 containing 0.3 M SiO2 nanoparticles, at 850°C. The main impurities are Al, Mg, Ca, Na. A photoelectrochemical method was demonstrated as a reliable and sensitive measurement for testing the quality of the silicon film. The as-deposited film exhibits 31% of the photocurrent response of a commercial p-type wafer. A comparison of graphite and silver substrates is presented, and the remaining problems are discussed.</description><identifier>ISSN: 0013-4651</identifier><identifier>EISSN: 1945-7111</identifier><identifier>DOI: 10.1149/2.0731609jes</identifier><language>eng</language><publisher>The Electrochemical Society</publisher><ispartof>Journal of the Electrochemical Society, 2016-01, Vol.163 (9), p.D506-D514</ispartof><rights>2016 The Electrochemical Society</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c404t-bf8346bd8105be2ed26f9f87c4656986d77acf9684dd03f90efa2df3245431523</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1149/2.0731609jes/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,4010,27900,27901,27902,53821</link.rule.ids></links><search><creatorcontrib>Zhao, Ji</creatorcontrib><creatorcontrib>Yin, Huayi</creatorcontrib><creatorcontrib>Lim, Taeho</creatorcontrib><creatorcontrib>Xie, Hongwei</creatorcontrib><creatorcontrib>Hsu, Hsien-Yi</creatorcontrib><creatorcontrib>Forouzan, Fardad</creatorcontrib><creatorcontrib>Bard, Allen J.</creatorcontrib><title>Electrodeposition of Photoactive Silicon Films for Low-Cost Solar Cells</title><title>Journal of the Electrochemical Society</title><addtitle>J. Electrochem. Soc</addtitle><description>Here we demonstrate progress on electrodeposition of photoactive silicon films from an environmentally friendly molten CaCl2 electrolyte, which is the first step of a new route to a practical low-cost silicon solar cell. We report electrodeposition of several-micron thick silicon films on a graphite substrate in a bath of molten CaCl2 containing SiO2 nanoparticles. The best silicon deposits was obtained at 6 mA/cm2 for 1 hour in molten CaCl2 containing 0.3 M SiO2 nanoparticles, at 850°C. The main impurities are Al, Mg, Ca, Na. A photoelectrochemical method was demonstrated as a reliable and sensitive measurement for testing the quality of the silicon film. The as-deposited film exhibits 31% of the photocurrent response of a commercial p-type wafer. A comparison of graphite and silver substrates is presented, and the remaining problems are discussed.</description><issn>0013-4651</issn><issn>1945-7111</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNptkE1LAzEYhIMouFZv_oAcPbg1b5LNbo6ytFUoKFTPyzYfmCXtW5JV8d-7UsGLp2GGh2EYQq6BzQGkvuNzVgtQTA8un5ACtKzKGgBOScEYiFKqCs7JRc7DZKGRdUFWi-jMmNC6A-YwBtxT9PT5DUfszRg-HN2EGMwUL0PcZeox0TV-li3mkW4w9om2LsZ8Sc58H7O7-tUZeV0uXtqHcv20emzv16WRTI7l1jdCqq1tgFVbx53lymvf1GaapnSjbF33xmvVSGuZ8Jo533PrBZeVFFBxMSO3x16TMOfkfHdIYdenrw5Y93NCx7u_Eyb85ogHPHQDvqf9NO5_9BsuD1xa</recordid><startdate>201601</startdate><enddate>201601</enddate><creator>Zhao, Ji</creator><creator>Yin, Huayi</creator><creator>Lim, Taeho</creator><creator>Xie, Hongwei</creator><creator>Hsu, Hsien-Yi</creator><creator>Forouzan, Fardad</creator><creator>Bard, Allen J.</creator><general>The Electrochemical Society</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>201601</creationdate><title>Electrodeposition of Photoactive Silicon Films for Low-Cost Solar Cells</title><author>Zhao, Ji ; Yin, Huayi ; Lim, Taeho ; Xie, Hongwei ; Hsu, Hsien-Yi ; Forouzan, Fardad ; Bard, Allen J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c404t-bf8346bd8105be2ed26f9f87c4656986d77acf9684dd03f90efa2df3245431523</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhao, Ji</creatorcontrib><creatorcontrib>Yin, Huayi</creatorcontrib><creatorcontrib>Lim, Taeho</creatorcontrib><creatorcontrib>Xie, Hongwei</creatorcontrib><creatorcontrib>Hsu, Hsien-Yi</creatorcontrib><creatorcontrib>Forouzan, Fardad</creatorcontrib><creatorcontrib>Bard, Allen J.</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zhao, Ji</au><au>Yin, Huayi</au><au>Lim, Taeho</au><au>Xie, Hongwei</au><au>Hsu, Hsien-Yi</au><au>Forouzan, Fardad</au><au>Bard, Allen J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrodeposition of Photoactive Silicon Films for Low-Cost Solar Cells</atitle><jtitle>Journal of the Electrochemical Society</jtitle><addtitle>J. Electrochem. Soc</addtitle><date>2016-01</date><risdate>2016</risdate><volume>163</volume><issue>9</issue><spage>D506</spage><epage>D514</epage><pages>D506-D514</pages><issn>0013-4651</issn><eissn>1945-7111</eissn><abstract>Here we demonstrate progress on electrodeposition of photoactive silicon films from an environmentally friendly molten CaCl2 electrolyte, which is the first step of a new route to a practical low-cost silicon solar cell. We report electrodeposition of several-micron thick silicon films on a graphite substrate in a bath of molten CaCl2 containing SiO2 nanoparticles. The best silicon deposits was obtained at 6 mA/cm2 for 1 hour in molten CaCl2 containing 0.3 M SiO2 nanoparticles, at 850°C. The main impurities are Al, Mg, Ca, Na. A photoelectrochemical method was demonstrated as a reliable and sensitive measurement for testing the quality of the silicon film. The as-deposited film exhibits 31% of the photocurrent response of a commercial p-type wafer. A comparison of graphite and silver substrates is presented, and the remaining problems are discussed.</abstract><pub>The Electrochemical Society</pub><doi>10.1149/2.0731609jes</doi><tpages>9</tpages></addata></record> |
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title | Electrodeposition of Photoactive Silicon Films for Low-Cost Solar Cells |
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