Chemical Mechanical Polishing of MgO Substrate and Its Effect on Fabrication of Atomic Step-Terrace Structures on MgO Surface by Subsequent High-Temperature Annealing

Single-crystalline MgO is used as a substrate for the deposition of various functional thin films. The present study focused on the development of a complete sequence of fabricating atomic step-terrace structures on the MgO substrate via a method that includes grinding, precise mechanical polishing,...

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Veröffentlicht in:	ECS journal of solid state science and technology 2022-11, Vol.11 (11), p.114005
Hauptverfasser:	Aida, Hideo, Ojima, Takumi, Oshima, Ryuji, Ihara, Takahiro, Takeda, Hidetoshi, Kimura, Yutaka, Sawabe, Atsuhito
Format:	Artikel
Sprache:	eng
Schlagworte:	chemical mechanical polishing (CMP) colloidal silica polishing high temperature annealing MgO substrate step terrace structure
Online-Zugang:	Volltext
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