Near-Room-Temperature Soft Plasma Pulsed Deposition of SiCxNy from 1,3,5-tri(isopropyl)cyclotrisilazane

Results are presented from an exploratory study of near-room-temperature pulsed deposition of SiCxNy thin films using 1,3,5-tri(isopropyl)cyclotrisilazane (TICZ, C9H27N3Si3) and soft remote ammonia (NH3) plasma co-reactants. The process involved four pulses: thermal adsorption of TICZ to the substra...

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Veröffentlicht in:	ECS transactions 2020-09, Vol.98 (3), p.121-135
Hauptverfasser:	Goff, Jonathan, Brick, Chad Michael, Kaloyeros, Alain, Arkles, Barry
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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