(Invited) Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects

Bound to complex perovskite systems, ferroelectric random access memory (FRAM) suffers from limited CMOS-compatibility and faces severe scaling issues in today´s and future technology nodes. Nevertheless, compared to its current-driven non-volatile memory contenders, the field-driven FRAM excels in...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:ECS transactions 2014-08, Vol.64 (8), p.159-168
Hauptverfasser: Müller, Johannes, Polakowski, Patrick, Müller, Stefan, Mikolajick, Thomas
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!