(Invited) Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements

Dealing with nanometer-sized particulate contamination is still one of the major challenges during the manufacturing of yielding semiconductor devices. This is especially true for the increasing number of critical processing steps, where residues of particulate matter need to be removed without mech...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	ECS transactions 2013-01, Vol.58 (6), p.3-15
Hauptverfasser:	Okorn-Schmidt, Harald F., Holsteyns, Frank, Lippert, Alexander, Mui, David, Kawaguchi, Mark, Lechner, Christiane, Frommhold, Philipp E., Nowak, Till, Mettin, Robert
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!