Effect of annealing treatment on the structure and performance of transparent conductive AZO/Al2O3 bi-layer films

Transparent and conductive Al-doped zinc oxide (AZO) films have a wider band gap, good optoelectronic characteristics, inexpensive and nontoxicity, compared with indium tin oxide (ITO). In this study, AZO films are deposited onto Al2O3/glass using magnetron sputtering. After deposition, both convent...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials research express 2019-07, Vol.6 (9)
Hauptverfasser: Li, Xiuyan, Tang, Weimin, Chen, Cihai, Lin, Chuanjin, Xu, Chunyao
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 9
container_start_page
container_title Materials research express
container_volume 6
creator Li, Xiuyan
Tang, Weimin
Chen, Cihai
Lin, Chuanjin
Xu, Chunyao
description Transparent and conductive Al-doped zinc oxide (AZO) films have a wider band gap, good optoelectronic characteristics, inexpensive and nontoxicity, compared with indium tin oxide (ITO). In this study, AZO films are deposited onto Al2O3/glass using magnetron sputtering. After deposition, both conventional annealing (CA) and rapid thermal annealing (RTA) are used to obtain a high quality AZO/Al2O3/glass bi-layer. The XRD and TEM images show that the film has a poly-crystalline nature with a hexagonal wurtzite-type structure. As the annealing temperature is increased, the intensity of the (0 0 2) diffraction peak increases and there is decrease in the full width at half maximum, which indicates that the films undergo a thermally activated process of grain growth and exhibit improved crystallization. RTA produces a larger grain, a greater carrier concentration and better crystallinity than CA. After RTA at 500 °C, the AZO/Al2O3 bi-layer films result in the lowest electrical resistivity, the highest optical transmittance and a good figure of merit. The bi-layer films are subject to a pull-off adhesion strength test, which shows that have a superior peel off stress. The experimental results show that these AZO/Al2O3 bi-layer films have good optoelectronic performance and adhesive strength.
doi_str_mv 10.1088/2053-1591/ab2e58
format Article
fullrecord <record><control><sourceid>iop</sourceid><recordid>TN_cdi_iop_journals_10_1088_2053_1591_ab2e58</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>mrxab2e58</sourcerecordid><originalsourceid>FETCH-LOGICAL-i223t-713922c6c47fb0b782f0ff3d9f2e5035306faaddb28cd41b567ceebe2c7f85d93</originalsourceid><addsrcrecordid>eNptkLtLA0EQhxdBMMT0lltZeWYf99oyhPgAIY02Nss-ZvTC3d65txH9770jYmU18OP7zTAfIVec3XJW12vBCpnxQvG1sQKK-ows_qILshrHA2NMVEoWolyQjx0iuER7pCYEMG0T3miKYFIHYYoDTe9AxxSPLh0jTJCnA0TsY2eCg7mXognjYOLMuz74iWw-gW5e9-tNK_aS2iZrzTdEik3bjZfkHE07wup3LsnL3e55-5A97e8ft5unrBFCpqziUgnhSpdXaJmtaoEMUXqF01NMFpKVaIz3VtTO59wWZeUALAhXYV14JZfk-rS36Qd96I8xTNd0F790qZVmqsx5rgePE3jzD8iZnnXq2Z2e3emTTvkDK1Nr0g</addsrcrecordid><sourcetype>Enrichment Source</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Effect of annealing treatment on the structure and performance of transparent conductive AZO/Al2O3 bi-layer films</title><source>IOP Publishing Journals</source><source>IOPscience extra</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Li, Xiuyan ; Tang, Weimin ; Chen, Cihai ; Lin, Chuanjin ; Xu, Chunyao</creator><creatorcontrib>Li, Xiuyan ; Tang, Weimin ; Chen, Cihai ; Lin, Chuanjin ; Xu, Chunyao</creatorcontrib><description>Transparent and conductive Al-doped zinc oxide (AZO) films have a wider band gap, good optoelectronic characteristics, inexpensive and nontoxicity, compared with indium tin oxide (ITO). In this study, AZO films are deposited onto Al2O3/glass using magnetron sputtering. After deposition, both conventional annealing (CA) and rapid thermal annealing (RTA) are used to obtain a high quality AZO/Al2O3/glass bi-layer. The XRD and TEM images show that the film has a poly-crystalline nature with a hexagonal wurtzite-type structure. As the annealing temperature is increased, the intensity of the (0 0 2) diffraction peak increases and there is decrease in the full width at half maximum, which indicates that the films undergo a thermally activated process of grain growth and exhibit improved crystallization. RTA produces a larger grain, a greater carrier concentration and better crystallinity than CA. After RTA at 500 °C, the AZO/Al2O3 bi-layer films result in the lowest electrical resistivity, the highest optical transmittance and a good figure of merit. The bi-layer films are subject to a pull-off adhesion strength test, which shows that have a superior peel off stress. The experimental results show that these AZO/Al2O3 bi-layer films have good optoelectronic performance and adhesive strength.</description><identifier>EISSN: 2053-1591</identifier><identifier>DOI: 10.1088/2053-1591/ab2e58</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>adhesion strength ; AZO/Al ; bi-layer ; figure of merit ; rapid thermal annealing</subject><ispartof>Materials research express, 2019-07, Vol.6 (9)</ispartof><rights>2019 IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0002-6467-6435</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/2053-1591/ab2e58/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,778,782,27907,27908,38851,53823,53829,53876</link.rule.ids></links><search><creatorcontrib>Li, Xiuyan</creatorcontrib><creatorcontrib>Tang, Weimin</creatorcontrib><creatorcontrib>Chen, Cihai</creatorcontrib><creatorcontrib>Lin, Chuanjin</creatorcontrib><creatorcontrib>Xu, Chunyao</creatorcontrib><title>Effect of annealing treatment on the structure and performance of transparent conductive AZO/Al2O3 bi-layer films</title><title>Materials research express</title><addtitle>MRX</addtitle><addtitle>Mater. Res. Express</addtitle><description>Transparent and conductive Al-doped zinc oxide (AZO) films have a wider band gap, good optoelectronic characteristics, inexpensive and nontoxicity, compared with indium tin oxide (ITO). In this study, AZO films are deposited onto Al2O3/glass using magnetron sputtering. After deposition, both conventional annealing (CA) and rapid thermal annealing (RTA) are used to obtain a high quality AZO/Al2O3/glass bi-layer. The XRD and TEM images show that the film has a poly-crystalline nature with a hexagonal wurtzite-type structure. As the annealing temperature is increased, the intensity of the (0 0 2) diffraction peak increases and there is decrease in the full width at half maximum, which indicates that the films undergo a thermally activated process of grain growth and exhibit improved crystallization. RTA produces a larger grain, a greater carrier concentration and better crystallinity than CA. After RTA at 500 °C, the AZO/Al2O3 bi-layer films result in the lowest electrical resistivity, the highest optical transmittance and a good figure of merit. The bi-layer films are subject to a pull-off adhesion strength test, which shows that have a superior peel off stress. The experimental results show that these AZO/Al2O3 bi-layer films have good optoelectronic performance and adhesive strength.</description><subject>adhesion strength</subject><subject>AZO/Al</subject><subject>bi-layer</subject><subject>figure of merit</subject><subject>rapid thermal annealing</subject><issn>2053-1591</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><sourceid/><recordid>eNptkLtLA0EQhxdBMMT0lltZeWYf99oyhPgAIY02Nss-ZvTC3d65txH9770jYmU18OP7zTAfIVec3XJW12vBCpnxQvG1sQKK-ows_qILshrHA2NMVEoWolyQjx0iuER7pCYEMG0T3miKYFIHYYoDTe9AxxSPLh0jTJCnA0TsY2eCg7mXognjYOLMuz74iWw-gW5e9-tNK_aS2iZrzTdEik3bjZfkHE07wup3LsnL3e55-5A97e8ft5unrBFCpqziUgnhSpdXaJmtaoEMUXqF01NMFpKVaIz3VtTO59wWZeUALAhXYV14JZfk-rS36Qd96I8xTNd0F790qZVmqsx5rgePE3jzD8iZnnXq2Z2e3emTTvkDK1Nr0g</recordid><startdate>20190710</startdate><enddate>20190710</enddate><creator>Li, Xiuyan</creator><creator>Tang, Weimin</creator><creator>Chen, Cihai</creator><creator>Lin, Chuanjin</creator><creator>Xu, Chunyao</creator><general>IOP Publishing</general><scope/><orcidid>https://orcid.org/0000-0002-6467-6435</orcidid></search><sort><creationdate>20190710</creationdate><title>Effect of annealing treatment on the structure and performance of transparent conductive AZO/Al2O3 bi-layer films</title><author>Li, Xiuyan ; Tang, Weimin ; Chen, Cihai ; Lin, Chuanjin ; Xu, Chunyao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i223t-713922c6c47fb0b782f0ff3d9f2e5035306faaddb28cd41b567ceebe2c7f85d93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>adhesion strength</topic><topic>AZO/Al</topic><topic>bi-layer</topic><topic>figure of merit</topic><topic>rapid thermal annealing</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Xiuyan</creatorcontrib><creatorcontrib>Tang, Weimin</creatorcontrib><creatorcontrib>Chen, Cihai</creatorcontrib><creatorcontrib>Lin, Chuanjin</creatorcontrib><creatorcontrib>Xu, Chunyao</creatorcontrib><jtitle>Materials research express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Xiuyan</au><au>Tang, Weimin</au><au>Chen, Cihai</au><au>Lin, Chuanjin</au><au>Xu, Chunyao</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of annealing treatment on the structure and performance of transparent conductive AZO/Al2O3 bi-layer films</atitle><jtitle>Materials research express</jtitle><stitle>MRX</stitle><addtitle>Mater. Res. Express</addtitle><date>2019-07-10</date><risdate>2019</risdate><volume>6</volume><issue>9</issue><eissn>2053-1591</eissn><abstract>Transparent and conductive Al-doped zinc oxide (AZO) films have a wider band gap, good optoelectronic characteristics, inexpensive and nontoxicity, compared with indium tin oxide (ITO). In this study, AZO films are deposited onto Al2O3/glass using magnetron sputtering. After deposition, both conventional annealing (CA) and rapid thermal annealing (RTA) are used to obtain a high quality AZO/Al2O3/glass bi-layer. The XRD and TEM images show that the film has a poly-crystalline nature with a hexagonal wurtzite-type structure. As the annealing temperature is increased, the intensity of the (0 0 2) diffraction peak increases and there is decrease in the full width at half maximum, which indicates that the films undergo a thermally activated process of grain growth and exhibit improved crystallization. RTA produces a larger grain, a greater carrier concentration and better crystallinity than CA. After RTA at 500 °C, the AZO/Al2O3 bi-layer films result in the lowest electrical resistivity, the highest optical transmittance and a good figure of merit. The bi-layer films are subject to a pull-off adhesion strength test, which shows that have a superior peel off stress. The experimental results show that these AZO/Al2O3 bi-layer films have good optoelectronic performance and adhesive strength.</abstract><pub>IOP Publishing</pub><doi>10.1088/2053-1591/ab2e58</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0002-6467-6435</orcidid></addata></record>
fulltext fulltext
identifier EISSN: 2053-1591
ispartof Materials research express, 2019-07, Vol.6 (9)
issn 2053-1591
language eng
recordid cdi_iop_journals_10_1088_2053_1591_ab2e58
source IOP Publishing Journals; IOPscience extra; Institute of Physics (IOP) Journals - HEAL-Link
subjects adhesion strength
AZO/Al
bi-layer
figure of merit
rapid thermal annealing
title Effect of annealing treatment on the structure and performance of transparent conductive AZO/Al2O3 bi-layer films
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T23%3A21%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20annealing%20treatment%20on%20the%20structure%20and%20performance%20of%20transparent%20conductive%20AZO/Al2O3%20bi-layer%20films&rft.jtitle=Materials%20research%20express&rft.au=Li,%20Xiuyan&rft.date=2019-07-10&rft.volume=6&rft.issue=9&rft.eissn=2053-1591&rft_id=info:doi/10.1088/2053-1591/ab2e58&rft_dat=%3Ciop%3Emrxab2e58%3C/iop%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true