Laser chemical vapor deposition of Lu2O3:Eu scintillation film

Lu2O3:Eu scintillation film is one of the most attractive candidate for the hard x-ray imaging, especially above 20 keV. A micro-columnar film with 10 m thickness of Lu2O3:Eu was firstly obtained by laser chemical vapor deposition on not-oriented Lu2O3 single crystal substrate. The morphology of obt...

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Veröffentlicht in:Materials research express 2019-08, Vol.6 (8)
Hauptverfasser: Chang, Jingyu, Qi, Yunhang, Zhao, Hengyu, Mao, Rihua, Chen, Bangrui, Feng, He, Xu, Zhan, Zhang, Zhijun, Zhao, Jingtai
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container_title Materials research express
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creator Chang, Jingyu
Qi, Yunhang
Zhao, Hengyu
Mao, Rihua
Chen, Bangrui
Feng, He
Xu, Zhan
Zhang, Zhijun
Zhao, Jingtai
description Lu2O3:Eu scintillation film is one of the most attractive candidate for the hard x-ray imaging, especially above 20 keV. A micro-columnar film with 10 m thickness of Lu2O3:Eu was firstly obtained by laser chemical vapor deposition on not-oriented Lu2O3 single crystal substrate. The morphology of obtained film was investigated by the scanning electron microscopy. The photoluminescence and scintillation properties were measured and discussed, including photoluminescence excitation and photoluminescence curves, photoluminescence decay curves, and x-ray excited luminescence curve.
doi_str_mv 10.1088/2053-1591/ab2000
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subjects Eu
LCVD
micro-columnar film
photoluminescence properties
scintillation properties
title Laser chemical vapor deposition of Lu2O3:Eu scintillation film
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