Experimental investigation of standing wave effect in dual-frequency capacitively coupled argon discharges: role of a low-frequency source

It is well known that the plasma non-uniformity caused by the standing wave effect has brought about great challenges for plasma material processing. To improve the plasma uniformity, a low-frequency (LF) power source is introduced into a 100 MHz very-high-frequency (VHF) capacitively coupled argon...

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Veröffentlicht in:	Plasma sources science & technology 2018-05, Vol.27 (5), p.55017
Hauptverfasser:	Zhao, Kai, Liu, Yong-Xin, Kawamura, E, Wen, De-Qi, Lieberman, M A, Wang, You-Nian
Format:	Artikel
Sprache:	eng
Schlagworte:	capacitively coupled plasmas dual-frequency Physics PROES standing wave effect uniformity
Online-Zugang:	Volltext
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