Investigation on the interaction between a gallium nitride surface and H2O using a nanometer-scale GaN lamella structure
Gallium nitride (GaN) is exceedingly apposite for liquid-based sensor applications because of their high internal piezoelectric polarization, chemical and high temperature stability. In this work, the interaction between GaN and H2O has been investigated using a novel methodology. We report the fabr...
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container_title | Journal of physics. D, Applied physics |
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creator | Taha, Inas Rajput, Nitul S Baik, Hionsuck Ravaux, Florent AlShehhi, Badreyya Choi, Daniel |
description | Gallium nitride (GaN) is exceedingly apposite for liquid-based sensor applications because of their high internal piezoelectric polarization, chemical and high temperature stability. In this work, the interaction between GaN and H2O has been investigated using a novel methodology. We report the fabrication of single crystal GaN lamella with thickness of few hundreds of nanometer using focused ion-beam milling technique, for sensing applications. Results signify that the device resistivity increases with time at room temperature during the GaN-H2O interaction. Such a change in electrical resistivity is explained based on the electron transfer and electrochemical reactions at the surface of GaN. Study of the surface chemistry transformation of the tested GaN lamella is conducted using high-angle annular dark-field scanning transmission electron microscopy coupled with electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) techniques. EDS and EELS results signify the presence of a region containing Ga and O at the interface of the H2O/GaN which is a result due to the adsorption of molecular H2O and its dissociation products implying the occurrence of GaN-water reaction. |
doi_str_mv | 10.1088/1361-6463/aba972 |
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fullrecord | <record><control><sourceid>iop</sourceid><recordid>TN_cdi_iop_journals_10_1088_1361_6463_aba972</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>daba972</sourcerecordid><originalsourceid>FETCH-LOGICAL-i223t-15cbdcec53e2b61fe70207e7dce25d2f775e25a9af523a83027c1d06c5c206a13</originalsourceid><addsrcrecordid>eNptkM1LAzEUxIMoWKt3jzl5cm0-mmR7lKJtodiLnsPb7Nuass2WTVb9802teBIG5jEM8-BHyC1nD5yV5YRLzQs91XICFcyMOCOjv-icjBgTopBGmEtyFeOOMaZ0yUfkaxU-MCa_heS7QLPSO1IfEvbgfqIK0ydioEC30LZ-2NPgU-9rpHHoG3BIIdR0KTZ0iD5scy9A6PaYF4rooEW6gBfawh7bFmhM_eDS0OM1uWigjXjz62Py9vz0Ol8W681iNX9cF14ImQquXFU7dEqiqDRv0DDBDJqcCVWLxhiVD5hBo4SEUjJhHK-ZdsoJpoHLMbk77fruYHfd0If8zdZWSTvVWYozaQ91k4v3_xQ5s0e89sjSHlnaE175DXQxbtE</addsrcrecordid><sourcetype>Enrichment Source</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Investigation on the interaction between a gallium nitride surface and H2O using a nanometer-scale GaN lamella structure</title><source>Institute of Physics Journals</source><creator>Taha, Inas ; Rajput, Nitul S ; Baik, Hionsuck ; Ravaux, Florent ; AlShehhi, Badreyya ; Choi, Daniel</creator><creatorcontrib>Taha, Inas ; Rajput, Nitul S ; Baik, Hionsuck ; Ravaux, Florent ; AlShehhi, Badreyya ; Choi, Daniel</creatorcontrib><description>Gallium nitride (GaN) is exceedingly apposite for liquid-based sensor applications because of their high internal piezoelectric polarization, chemical and high temperature stability. In this work, the interaction between GaN and H2O has been investigated using a novel methodology. We report the fabrication of single crystal GaN lamella with thickness of few hundreds of nanometer using focused ion-beam milling technique, for sensing applications. Results signify that the device resistivity increases with time at room temperature during the GaN-H2O interaction. Such a change in electrical resistivity is explained based on the electron transfer and electrochemical reactions at the surface of GaN. Study of the surface chemistry transformation of the tested GaN lamella is conducted using high-angle annular dark-field scanning transmission electron microscopy coupled with electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) techniques. EDS and EELS results signify the presence of a region containing Ga and O at the interface of the H2O/GaN which is a result due to the adsorption of molecular H2O and its dissociation products implying the occurrence of GaN-water reaction.</description><identifier>ISSN: 0022-3727</identifier><identifier>EISSN: 1361-6463</identifier><identifier>DOI: 10.1088/1361-6463/aba972</identifier><identifier>CODEN: JPAPBE</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>electron energy loss spectroscopy ; focused ion-beam ; gallium nitride-water interaction ; nanoscale device characterization</subject><ispartof>Journal of physics. D, Applied physics, 2020-11, Vol.53 (46)</ispartof><rights>2020 IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0001-8868-909X ; 0000-0001-6102-9374</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/1361-6463/aba972/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27924,27925,53846,53893</link.rule.ids></links><search><creatorcontrib>Taha, Inas</creatorcontrib><creatorcontrib>Rajput, Nitul S</creatorcontrib><creatorcontrib>Baik, Hionsuck</creatorcontrib><creatorcontrib>Ravaux, Florent</creatorcontrib><creatorcontrib>AlShehhi, Badreyya</creatorcontrib><creatorcontrib>Choi, Daniel</creatorcontrib><title>Investigation on the interaction between a gallium nitride surface and H2O using a nanometer-scale GaN lamella structure</title><title>Journal of physics. D, Applied physics</title><addtitle>JPhysD</addtitle><addtitle>J. Phys. D: Appl. Phys</addtitle><description>Gallium nitride (GaN) is exceedingly apposite for liquid-based sensor applications because of their high internal piezoelectric polarization, chemical and high temperature stability. In this work, the interaction between GaN and H2O has been investigated using a novel methodology. We report the fabrication of single crystal GaN lamella with thickness of few hundreds of nanometer using focused ion-beam milling technique, for sensing applications. Results signify that the device resistivity increases with time at room temperature during the GaN-H2O interaction. Such a change in electrical resistivity is explained based on the electron transfer and electrochemical reactions at the surface of GaN. Study of the surface chemistry transformation of the tested GaN lamella is conducted using high-angle annular dark-field scanning transmission electron microscopy coupled with electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) techniques. EDS and EELS results signify the presence of a region containing Ga and O at the interface of the H2O/GaN which is a result due to the adsorption of molecular H2O and its dissociation products implying the occurrence of GaN-water reaction.</description><subject>electron energy loss spectroscopy</subject><subject>focused ion-beam</subject><subject>gallium nitride-water interaction</subject><subject>nanoscale device characterization</subject><issn>0022-3727</issn><issn>1361-6463</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid/><recordid>eNptkM1LAzEUxIMoWKt3jzl5cm0-mmR7lKJtodiLnsPb7Nuass2WTVb9802teBIG5jEM8-BHyC1nD5yV5YRLzQs91XICFcyMOCOjv-icjBgTopBGmEtyFeOOMaZ0yUfkaxU-MCa_heS7QLPSO1IfEvbgfqIK0ydioEC30LZ-2NPgU-9rpHHoG3BIIdR0KTZ0iD5scy9A6PaYF4rooEW6gBfawh7bFmhM_eDS0OM1uWigjXjz62Py9vz0Ol8W681iNX9cF14ImQquXFU7dEqiqDRv0DDBDJqcCVWLxhiVD5hBo4SEUjJhHK-ZdsoJpoHLMbk77fruYHfd0If8zdZWSTvVWYozaQ91k4v3_xQ5s0e89sjSHlnaE175DXQxbtE</recordid><startdate>20201111</startdate><enddate>20201111</enddate><creator>Taha, Inas</creator><creator>Rajput, Nitul S</creator><creator>Baik, Hionsuck</creator><creator>Ravaux, Florent</creator><creator>AlShehhi, Badreyya</creator><creator>Choi, Daniel</creator><general>IOP Publishing</general><scope/><orcidid>https://orcid.org/0000-0001-8868-909X</orcidid><orcidid>https://orcid.org/0000-0001-6102-9374</orcidid></search><sort><creationdate>20201111</creationdate><title>Investigation on the interaction between a gallium nitride surface and H2O using a nanometer-scale GaN lamella structure</title><author>Taha, Inas ; Rajput, Nitul S ; Baik, Hionsuck ; Ravaux, Florent ; AlShehhi, Badreyya ; Choi, Daniel</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i223t-15cbdcec53e2b61fe70207e7dce25d2f775e25a9af523a83027c1d06c5c206a13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>electron energy loss spectroscopy</topic><topic>focused ion-beam</topic><topic>gallium nitride-water interaction</topic><topic>nanoscale device characterization</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Taha, Inas</creatorcontrib><creatorcontrib>Rajput, Nitul S</creatorcontrib><creatorcontrib>Baik, Hionsuck</creatorcontrib><creatorcontrib>Ravaux, Florent</creatorcontrib><creatorcontrib>AlShehhi, Badreyya</creatorcontrib><creatorcontrib>Choi, Daniel</creatorcontrib><jtitle>Journal of physics. D, Applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Taha, Inas</au><au>Rajput, Nitul S</au><au>Baik, Hionsuck</au><au>Ravaux, Florent</au><au>AlShehhi, Badreyya</au><au>Choi, Daniel</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Investigation on the interaction between a gallium nitride surface and H2O using a nanometer-scale GaN lamella structure</atitle><jtitle>Journal of physics. D, Applied physics</jtitle><stitle>JPhysD</stitle><addtitle>J. Phys. D: Appl. Phys</addtitle><date>2020-11-11</date><risdate>2020</risdate><volume>53</volume><issue>46</issue><issn>0022-3727</issn><eissn>1361-6463</eissn><coden>JPAPBE</coden><abstract>Gallium nitride (GaN) is exceedingly apposite for liquid-based sensor applications because of their high internal piezoelectric polarization, chemical and high temperature stability. In this work, the interaction between GaN and H2O has been investigated using a novel methodology. We report the fabrication of single crystal GaN lamella with thickness of few hundreds of nanometer using focused ion-beam milling technique, for sensing applications. Results signify that the device resistivity increases with time at room temperature during the GaN-H2O interaction. Such a change in electrical resistivity is explained based on the electron transfer and electrochemical reactions at the surface of GaN. Study of the surface chemistry transformation of the tested GaN lamella is conducted using high-angle annular dark-field scanning transmission electron microscopy coupled with electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) techniques. EDS and EELS results signify the presence of a region containing Ga and O at the interface of the H2O/GaN which is a result due to the adsorption of molecular H2O and its dissociation products implying the occurrence of GaN-water reaction.</abstract><pub>IOP Publishing</pub><doi>10.1088/1361-6463/aba972</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0001-8868-909X</orcidid><orcidid>https://orcid.org/0000-0001-6102-9374</orcidid></addata></record> |
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subjects | electron energy loss spectroscopy focused ion-beam gallium nitride-water interaction nanoscale device characterization |
title | Investigation on the interaction between a gallium nitride surface and H2O using a nanometer-scale GaN lamella structure |
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