Oxygen content dependent etch rate of single polymer microparticles confined in the sheath region of a low pressure radiofrequency argon/oxygen plasma

To study the etching of polymer microparticles confined in low pressure radiofrequency plasmas, the size and refractive index of single 2 μm particles are experimentally obtained as a function of both time and oxygen content (0%-50%) added to the argon background gas. The etch rate was found to depe...

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Veröffentlicht in:	Journal of physics. D, Applied physics Applied physics, 2018-09, Vol.51 (37), p.375203
Hauptverfasser:	Schepers, L P T, IJzerman, W L, Beckers, J
Format:	Artikel
Sprache:	eng
Schlagworte:	argon/oxygen plasma microparticle etching plasma sheath
Online-Zugang:	Volltext
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