Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation

Atomic- or nanometer-scale roughness on feature surfaces has become an important issue to be resolved in the fabrication of nanoscale devices in industry. Moreover, in some cases, smoothing of initially rough surfaces is required for planarization of film surfaces, and controlled surface roughening...

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Veröffentlicht in:	Journal of physics. D, Applied physics Applied physics, 2017-10, Vol.50 (41), p.414001
Hauptverfasser:	Ono, Kouichi, Nakazaki, Nobuya, Tsuda, Hirotaka, Takao, Yoshinori, Eriguchi, Koji
Format:	Artikel
Sprache:	eng
Schlagworte:	molecular dynamics (MD) Monte Carlo (MC) plasma etching plasma-surface interactions silicon surface morphology evolution surface roughness
Online-Zugang:	Volltext
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