Surround Gate Transistor With Epitaxially Grown Si Pillar and Simulation Study on Soft Error and Rowhammer Tolerance for DRAM
A new dynamic random access memory (DRAM) memory cell transistor is fabricated, and its soft-error immunity and rowhammer tolerance are studied. The vertical channel is formed by selective epitaxial growth of silicon pillar, and the surround gate forms a fully depleted (FD) channel, which can suppre...
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Veröffentlicht in: | IEEE transactions on electron devices 2021-02, Vol.68 (2), p.529-534 |
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Hauptverfasser: | , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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