Large area line beam formation in Nissin ion doping system for TFT LCD fabrication

The Nissin ion doping system ID6700 for TFT LCD fabrication uses a large area ion source generating a uniform line beam which irradiates a large glass substrate. A uniform ion beam can be obtained across a large substrate over 600 mm, which is automatically tuned by individually adjusting the heatin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Andoh, Y., Inouchi, Y., Konishi, M., Tatemichi, J., Tanaka, H., Miyamoto, N., Matsuda, Y., Maeno, S., Naito, M.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Data mining Doping Fabrication Glass Heating Hydrogen Ion beams Ion sources Particle beams Thin film transistors
Online-Zugang:	Volltext bestellen
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