Micromachined Faraday cup array using deep reactive ion etching
A micromachined Faraday cup array (MFCA) for position sensitive ion detection has been developed using a deep reactive ion etching (DRIE) process. Linear, closely spaced arrays of 64, 128, and 256 cups have been produced with pitches of 250 /spl mu/m and 150 /spl mu/m. Low leakage MOS capacitors for...
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creator | Darling, R.B. Scheidemann, A.A. Bhat, K.N. Tai-Chang Chen |
description | A micromachined Faraday cup array (MFCA) for position sensitive ion detection has been developed using a deep reactive ion etching (DRIE) process. Linear, closely spaced arrays of 64, 128, and 256 cups have been produced with pitches of 250 /spl mu/m and 150 /spl mu/m. Low leakage MOS capacitors formed into DRIE trenches form effective ion collection traps with stable and electrostatically isolated capacitances. These closely spaced arrays of Faraday cups enable a new generation of compact mass spectrometers with true multi-channel detection capability. Since all of the incident ion flux is continuously intercepted by the array, no ion flux is lost as in scanning systems, and the overall sensitivity of the mass spectrometer is drastically improved by a factor approximately equal to the number of cups in the array. The MFCA is thus an ideal component for miniaturized mass spectrometers, ion beam profiling, and chemical analyzers which must work with very small sample volumes or high throughputs. |
doi_str_mv | 10.1109/MEMSYS.2001.906486 |
format | Conference Proceeding |
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Linear, closely spaced arrays of 64, 128, and 256 cups have been produced with pitches of 250 /spl mu/m and 150 /spl mu/m. Low leakage MOS capacitors formed into DRIE trenches form effective ion collection traps with stable and electrostatically isolated capacitances. These closely spaced arrays of Faraday cups enable a new generation of compact mass spectrometers with true multi-channel detection capability. Since all of the incident ion flux is continuously intercepted by the array, no ion flux is lost as in scanning systems, and the overall sensitivity of the mass spectrometer is drastically improved by a factor approximately equal to the number of cups in the array. The MFCA is thus an ideal component for miniaturized mass spectrometers, ion beam profiling, and chemical analyzers which must work with very small sample volumes or high throughputs.</description><identifier>ISSN: 1084-6999</identifier><identifier>ISBN: 9780780359987</identifier><identifier>ISBN: 0780359984</identifier><identifier>DOI: 10.1109/MEMSYS.2001.906486</identifier><language>eng</language><publisher>IEEE</publisher><subject>Chemical analysis ; Coaxial components ; Dynamic range ; Etching ; Geometry ; Mass spectroscopy ; Parasitic capacitance ; Position sensitive particle detectors ; Sensor arrays ; Stability</subject><ispartof>Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. 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The MFCA is thus an ideal component for miniaturized mass spectrometers, ion beam profiling, and chemical analyzers which must work with very small sample volumes or high throughputs.</description><subject>Chemical analysis</subject><subject>Coaxial components</subject><subject>Dynamic range</subject><subject>Etching</subject><subject>Geometry</subject><subject>Mass spectroscopy</subject><subject>Parasitic capacitance</subject><subject>Position sensitive particle detectors</subject><subject>Sensor arrays</subject><subject>Stability</subject><issn>1084-6999</issn><isbn>9780780359987</isbn><isbn>0780359984</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2001</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotj8FKAzEURQMqWGt_oKv8wIwvmUwmbyVSWit0cFFduCovkzc1YtshMxX691YqXLhncw9cIaYKcqUAH-p5vf5Y5xpA5QjWOHslJlg5OKcoEV11LUYKnMksIt6Ku77_AtCgDI7EYx2bdNhR8xn3HOSCEgU6yebYSUrpTMc-7rcyMHcyMTVD_GEZD3vJw99key9uWvruefLfY_G-mL_Nltnq9fll9rTKogIzZNY6XwQquUGlMTjrQ1kWHpWvvNbGQODW-5bAtrrSWLa6pAZIB0ceWVMxFtOLNzLzpktxR-m0udwtfgHut0ok</recordid><startdate>2001</startdate><enddate>2001</enddate><creator>Darling, R.B.</creator><creator>Scheidemann, A.A.</creator><creator>Bhat, K.N.</creator><creator>Tai-Chang Chen</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>2001</creationdate><title>Micromachined Faraday cup array using deep reactive ion etching</title><author>Darling, R.B. ; Scheidemann, A.A. ; Bhat, K.N. ; Tai-Chang Chen</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i104t-668b3da5ec9129d86bd553b91b7b22440defbbfa06f27295f25ac0a2d8ab9e2a3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Chemical analysis</topic><topic>Coaxial components</topic><topic>Dynamic range</topic><topic>Etching</topic><topic>Geometry</topic><topic>Mass spectroscopy</topic><topic>Parasitic capacitance</topic><topic>Position sensitive particle detectors</topic><topic>Sensor arrays</topic><topic>Stability</topic><toplevel>online_resources</toplevel><creatorcontrib>Darling, R.B.</creatorcontrib><creatorcontrib>Scheidemann, A.A.</creatorcontrib><creatorcontrib>Bhat, K.N.</creatorcontrib><creatorcontrib>Tai-Chang Chen</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Darling, R.B.</au><au>Scheidemann, A.A.</au><au>Bhat, K.N.</au><au>Tai-Chang Chen</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Micromachined Faraday cup array using deep reactive ion etching</atitle><btitle>Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)</btitle><stitle>MEMSYS</stitle><date>2001</date><risdate>2001</risdate><spage>90</spage><epage>93</epage><pages>90-93</pages><issn>1084-6999</issn><isbn>9780780359987</isbn><isbn>0780359984</isbn><abstract>A micromachined Faraday cup array (MFCA) for position sensitive ion detection has been developed using a deep reactive ion etching (DRIE) process. Linear, closely spaced arrays of 64, 128, and 256 cups have been produced with pitches of 250 /spl mu/m and 150 /spl mu/m. Low leakage MOS capacitors formed into DRIE trenches form effective ion collection traps with stable and electrostatically isolated capacitances. These closely spaced arrays of Faraday cups enable a new generation of compact mass spectrometers with true multi-channel detection capability. Since all of the incident ion flux is continuously intercepted by the array, no ion flux is lost as in scanning systems, and the overall sensitivity of the mass spectrometer is drastically improved by a factor approximately equal to the number of cups in the array. The MFCA is thus an ideal component for miniaturized mass spectrometers, ion beam profiling, and chemical analyzers which must work with very small sample volumes or high throughputs.</abstract><pub>IEEE</pub><doi>10.1109/MEMSYS.2001.906486</doi><tpages>4</tpages></addata></record> |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Chemical analysis Coaxial components Dynamic range Etching Geometry Mass spectroscopy Parasitic capacitance Position sensitive particle detectors Sensor arrays Stability |
title | Micromachined Faraday cup array using deep reactive ion etching |
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