A defect-to-yield correlation study for marginally printing reticle defects in the manufacture of a 16Mb flash memory device

This paper presents a defect-to-yield correlation for marginally printing defects in a gate and a contact 4X DUV reticle by describing their respective impact on the lithography manufacturing process window of a 16Mb flash memory device. The study includes site-dependent sort yield signature analysi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Erhardt, J., Phan, K., Backe, E., Tran, Q., Fletcher, B., Hopper, C.B., Peterson, I., Zuo, A.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Contacts Flash memory Inspection Lithography Manufacturing processes Printing Resists Software measurement Strips Testing
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