GaN based high electron mobility transistors for microwave and RF control applications

Heterojunction field-effect transistors (HFETs) or high-electron mobility transistors (HEMTs) based on Al/sub x/Ga/sub 1-x/N/GaN are studied for their use as control components for high-power microwave and RF control devices (switches, phase-shifters, etc.). A linear operation model was developed fo...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Drozdovski, N., Caverly, R.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 555 vol. 2
container_issue
container_start_page 552
container_title
container_volume 2
creator Drozdovski, N.
Caverly, R.
description Heterojunction field-effect transistors (HFETs) or high-electron mobility transistors (HEMTs) based on Al/sub x/Ga/sub 1-x/N/GaN are studied for their use as control components for high-power microwave and RF control devices (switches, phase-shifters, etc.). A linear operation model was developed for these components so that optimum transistor geometry and operation parameters may be determined for their use in this application. It was experimentally established that the HFET resistance is low for voltages of +1.0 volts, and that the capacitive reactance increases for DC gate voltages below the threshold voltage of approximately -1.5 volts.
doi_str_mv 10.1109/IMOC.1999.866242
format Conference Proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_866242</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>866242</ieee_id><sourcerecordid>866242</sourcerecordid><originalsourceid>FETCH-ieee_primary_8662423</originalsourceid><addsrcrecordid>eNp9jjsLwjAURgMi-NzF6f4Ba9raR-bia1BBxFWuNdoraVKSoPjvFXT2W85wOPAxNgp5EIZcTNebXRGEQoggT9NoFrVYj2c5j5OcZ7MOGzp355_FIkki3mXHJW7hjE5eoKJbBVLJ0lujoTZnUuRf4C1qR84b6-BqLNRUWvPEhwTUF9gvoDT6UyjAplFUoiej3YC1r6icHP7YZ-PF_FCsJiSlPDWWarSv0_dh_Fe-AfhZQME</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>GaN based high electron mobility transistors for microwave and RF control applications</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Drozdovski, N. ; Caverly, R.</creator><creatorcontrib>Drozdovski, N. ; Caverly, R.</creatorcontrib><description>Heterojunction field-effect transistors (HFETs) or high-electron mobility transistors (HEMTs) based on Al/sub x/Ga/sub 1-x/N/GaN are studied for their use as control components for high-power microwave and RF control devices (switches, phase-shifters, etc.). A linear operation model was developed for these components so that optimum transistor geometry and operation parameters may be determined for their use in this application. It was experimentally established that the HFET resistance is low for voltages of +1.0 volts, and that the capacitive reactance increases for DC gate voltages below the threshold voltage of approximately -1.5 volts.</description><identifier>ISBN: 0780358074</identifier><identifier>ISBN: 9780780358072</identifier><identifier>DOI: 10.1109/IMOC.1999.866242</identifier><language>eng</language><publisher>IEEE</publisher><subject>FETs ; Gallium nitride ; HEMTs ; Heterojunctions ; Microwave devices ; MODFETs ; Radio frequency ; Solid modeling ; Switches ; Threshold voltage</subject><ispartof>1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference, 1999, Vol.2, p.552-555 vol. 2</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/866242$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,4050,4051,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/866242$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Drozdovski, N.</creatorcontrib><creatorcontrib>Caverly, R.</creatorcontrib><title>GaN based high electron mobility transistors for microwave and RF control applications</title><title>1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference</title><addtitle>IMOC</addtitle><description>Heterojunction field-effect transistors (HFETs) or high-electron mobility transistors (HEMTs) based on Al/sub x/Ga/sub 1-x/N/GaN are studied for their use as control components for high-power microwave and RF control devices (switches, phase-shifters, etc.). A linear operation model was developed for these components so that optimum transistor geometry and operation parameters may be determined for their use in this application. It was experimentally established that the HFET resistance is low for voltages of +1.0 volts, and that the capacitive reactance increases for DC gate voltages below the threshold voltage of approximately -1.5 volts.</description><subject>FETs</subject><subject>Gallium nitride</subject><subject>HEMTs</subject><subject>Heterojunctions</subject><subject>Microwave devices</subject><subject>MODFETs</subject><subject>Radio frequency</subject><subject>Solid modeling</subject><subject>Switches</subject><subject>Threshold voltage</subject><isbn>0780358074</isbn><isbn>9780780358072</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1999</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9jjsLwjAURgMi-NzF6f4Ba9raR-bia1BBxFWuNdoraVKSoPjvFXT2W85wOPAxNgp5EIZcTNebXRGEQoggT9NoFrVYj2c5j5OcZ7MOGzp355_FIkki3mXHJW7hjE5eoKJbBVLJ0lujoTZnUuRf4C1qR84b6-BqLNRUWvPEhwTUF9gvoDT6UyjAplFUoiej3YC1r6icHP7YZ-PF_FCsJiSlPDWWarSv0_dh_Fe-AfhZQME</recordid><startdate>1999</startdate><enddate>1999</enddate><creator>Drozdovski, N.</creator><creator>Caverly, R.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>1999</creationdate><title>GaN based high electron mobility transistors for microwave and RF control applications</title><author>Drozdovski, N. ; Caverly, R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_8662423</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1999</creationdate><topic>FETs</topic><topic>Gallium nitride</topic><topic>HEMTs</topic><topic>Heterojunctions</topic><topic>Microwave devices</topic><topic>MODFETs</topic><topic>Radio frequency</topic><topic>Solid modeling</topic><topic>Switches</topic><topic>Threshold voltage</topic><toplevel>online_resources</toplevel><creatorcontrib>Drozdovski, N.</creatorcontrib><creatorcontrib>Caverly, R.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Drozdovski, N.</au><au>Caverly, R.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>GaN based high electron mobility transistors for microwave and RF control applications</atitle><btitle>1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference</btitle><stitle>IMOC</stitle><date>1999</date><risdate>1999</risdate><volume>2</volume><spage>552</spage><epage>555 vol. 2</epage><pages>552-555 vol. 2</pages><isbn>0780358074</isbn><isbn>9780780358072</isbn><abstract>Heterojunction field-effect transistors (HFETs) or high-electron mobility transistors (HEMTs) based on Al/sub x/Ga/sub 1-x/N/GaN are studied for their use as control components for high-power microwave and RF control devices (switches, phase-shifters, etc.). A linear operation model was developed for these components so that optimum transistor geometry and operation parameters may be determined for their use in this application. It was experimentally established that the HFET resistance is low for voltages of +1.0 volts, and that the capacitive reactance increases for DC gate voltages below the threshold voltage of approximately -1.5 volts.</abstract><pub>IEEE</pub><doi>10.1109/IMOC.1999.866242</doi></addata></record>
fulltext fulltext_linktorsrc
identifier ISBN: 0780358074
ispartof 1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference, 1999, Vol.2, p.552-555 vol. 2
issn
language eng
recordid cdi_ieee_primary_866242
source IEEE Electronic Library (IEL) Conference Proceedings
subjects FETs
Gallium nitride
HEMTs
Heterojunctions
Microwave devices
MODFETs
Radio frequency
Solid modeling
Switches
Threshold voltage
title GaN based high electron mobility transistors for microwave and RF control applications
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T07%3A39%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=GaN%20based%20high%20electron%20mobility%20transistors%20for%20microwave%20and%20RF%20control%20applications&rft.btitle=1999%20SBMO/IEEE%20MTT-S%20International%20Microwave%20and%20Optoelectronics%20Conference&rft.au=Drozdovski,%20N.&rft.date=1999&rft.volume=2&rft.spage=552&rft.epage=555%20vol.%202&rft.pages=552-555%20vol.%202&rft.isbn=0780358074&rft.isbn_list=9780780358072&rft_id=info:doi/10.1109/IMOC.1999.866242&rft_dat=%3Cieee_6IE%3E866242%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=866242&rfr_iscdi=true