Design and fabrication of SiO/sub 2//Si/sub 3/N/sub 4/ CVD optical waveguides
In this paper the design and fabrication of silicon-based optical waveguides are revisited. The goal was to develop a novel deposition process to minimize leakage losses, by allowing the deposition of a thick SiO/sub 2/ lower cladding as an optical buffer layer. Indeed, comparison between theory and...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Tagungsbericht |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 457 vol. 2 |
|---|---|
| container_issue | |
| container_start_page | 454 |
| container_title | |
| container_volume | 2 |
| creator | Bulla, D.A.P. Borges, B.V. Romero, M.A. Morimoto, N.I. Neto, L.G. Cortes, A.L. |
| description | In this paper the design and fabrication of silicon-based optical waveguides are revisited. The goal was to develop a novel deposition process to minimize leakage losses, by allowing the deposition of a thick SiO/sub 2/ lower cladding as an optical buffer layer. Indeed, comparison between theory and experimental data suggests that for the fabricated waveguides the dominant loss mechanism is scattering caused by side-walls surface roughness. Optical characterization yielded losses in the same range of state-of-art devices reported in the literature. |
| doi_str_mv | 10.1109/IMOC.1999.866156 |
| format | Conference Proceeding |
| fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_866156</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>866156</ieee_id><sourcerecordid>866156</sourcerecordid><originalsourceid>FETCH-ieee_primary_8661563</originalsourceid><addsrcrecordid>eNp9jjsPgjAYRZsYE1_sxql_QNpSXp1BowMyYFxJkUI-g0AoaPz3EnX2Lucm5w4XoTWjJmNUkGMUByYTQpi-6zLHnaAF9XzKHZ969gwZWt_oGC4cx6JzFIVKQ1ljWee4kFkHV9lDU-OmwAnERA8ZtghJ4NM4OX1oExxcQty0_Tiv8FM-VDlArvQKTQtZaWX8uESb_e4cHLaglErbDu6ye6XfY_yvfAM9IjpN</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Design and fabrication of SiO/sub 2//Si/sub 3/N/sub 4/ CVD optical waveguides</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Bulla, D.A.P. ; Borges, B.V. ; Romero, M.A. ; Morimoto, N.I. ; Neto, L.G. ; Cortes, A.L.</creator><creatorcontrib>Bulla, D.A.P. ; Borges, B.V. ; Romero, M.A. ; Morimoto, N.I. ; Neto, L.G. ; Cortes, A.L.</creatorcontrib><description>In this paper the design and fabrication of silicon-based optical waveguides are revisited. The goal was to develop a novel deposition process to minimize leakage losses, by allowing the deposition of a thick SiO/sub 2/ lower cladding as an optical buffer layer. Indeed, comparison between theory and experimental data suggests that for the fabricated waveguides the dominant loss mechanism is scattering caused by side-walls surface roughness. Optical characterization yielded losses in the same range of state-of-art devices reported in the literature.</description><identifier>ISBN: 0780358074</identifier><identifier>ISBN: 9780780358072</identifier><identifier>DOI: 10.1109/IMOC.1999.866156</identifier><language>eng</language><publisher>IEEE</publisher><subject>Optical buffering ; Optical design ; Optical device fabrication ; Optical losses ; Optical scattering ; Optical surface waves ; Optical waveguide theory ; Optical waveguides ; Rough surfaces ; Surface waves</subject><ispartof>1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference, 1999, Vol.2, p.454-457 vol. 2</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/866156$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,4036,4037,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/866156$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Bulla, D.A.P.</creatorcontrib><creatorcontrib>Borges, B.V.</creatorcontrib><creatorcontrib>Romero, M.A.</creatorcontrib><creatorcontrib>Morimoto, N.I.</creatorcontrib><creatorcontrib>Neto, L.G.</creatorcontrib><creatorcontrib>Cortes, A.L.</creatorcontrib><title>Design and fabrication of SiO/sub 2//Si/sub 3/N/sub 4/ CVD optical waveguides</title><title>1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference</title><addtitle>IMOC</addtitle><description>In this paper the design and fabrication of silicon-based optical waveguides are revisited. The goal was to develop a novel deposition process to minimize leakage losses, by allowing the deposition of a thick SiO/sub 2/ lower cladding as an optical buffer layer. Indeed, comparison between theory and experimental data suggests that for the fabricated waveguides the dominant loss mechanism is scattering caused by side-walls surface roughness. Optical characterization yielded losses in the same range of state-of-art devices reported in the literature.</description><subject>Optical buffering</subject><subject>Optical design</subject><subject>Optical device fabrication</subject><subject>Optical losses</subject><subject>Optical scattering</subject><subject>Optical surface waves</subject><subject>Optical waveguide theory</subject><subject>Optical waveguides</subject><subject>Rough surfaces</subject><subject>Surface waves</subject><isbn>0780358074</isbn><isbn>9780780358072</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1999</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9jjsPgjAYRZsYE1_sxql_QNpSXp1BowMyYFxJkUI-g0AoaPz3EnX2Lucm5w4XoTWjJmNUkGMUByYTQpi-6zLHnaAF9XzKHZ969gwZWt_oGC4cx6JzFIVKQ1ljWee4kFkHV9lDU-OmwAnERA8ZtghJ4NM4OX1oExxcQty0_Tiv8FM-VDlArvQKTQtZaWX8uESb_e4cHLaglErbDu6ye6XfY_yvfAM9IjpN</recordid><startdate>1999</startdate><enddate>1999</enddate><creator>Bulla, D.A.P.</creator><creator>Borges, B.V.</creator><creator>Romero, M.A.</creator><creator>Morimoto, N.I.</creator><creator>Neto, L.G.</creator><creator>Cortes, A.L.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>1999</creationdate><title>Design and fabrication of SiO/sub 2//Si/sub 3/N/sub 4/ CVD optical waveguides</title><author>Bulla, D.A.P. ; Borges, B.V. ; Romero, M.A. ; Morimoto, N.I. ; Neto, L.G. ; Cortes, A.L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_8661563</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Optical buffering</topic><topic>Optical design</topic><topic>Optical device fabrication</topic><topic>Optical losses</topic><topic>Optical scattering</topic><topic>Optical surface waves</topic><topic>Optical waveguide theory</topic><topic>Optical waveguides</topic><topic>Rough surfaces</topic><topic>Surface waves</topic><toplevel>online_resources</toplevel><creatorcontrib>Bulla, D.A.P.</creatorcontrib><creatorcontrib>Borges, B.V.</creatorcontrib><creatorcontrib>Romero, M.A.</creatorcontrib><creatorcontrib>Morimoto, N.I.</creatorcontrib><creatorcontrib>Neto, L.G.</creatorcontrib><creatorcontrib>Cortes, A.L.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Bulla, D.A.P.</au><au>Borges, B.V.</au><au>Romero, M.A.</au><au>Morimoto, N.I.</au><au>Neto, L.G.</au><au>Cortes, A.L.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Design and fabrication of SiO/sub 2//Si/sub 3/N/sub 4/ CVD optical waveguides</atitle><btitle>1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference</btitle><stitle>IMOC</stitle><date>1999</date><risdate>1999</risdate><volume>2</volume><spage>454</spage><epage>457 vol. 2</epage><pages>454-457 vol. 2</pages><isbn>0780358074</isbn><isbn>9780780358072</isbn><abstract>In this paper the design and fabrication of silicon-based optical waveguides are revisited. The goal was to develop a novel deposition process to minimize leakage losses, by allowing the deposition of a thick SiO/sub 2/ lower cladding as an optical buffer layer. Indeed, comparison between theory and experimental data suggests that for the fabricated waveguides the dominant loss mechanism is scattering caused by side-walls surface roughness. Optical characterization yielded losses in the same range of state-of-art devices reported in the literature.</abstract><pub>IEEE</pub><doi>10.1109/IMOC.1999.866156</doi></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | ISBN: 0780358074 |
| ispartof | 1999 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference, 1999, Vol.2, p.454-457 vol. 2 |
| issn | |
| language | eng |
| recordid | cdi_ieee_primary_866156 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Optical buffering Optical design Optical device fabrication Optical losses Optical scattering Optical surface waves Optical waveguide theory Optical waveguides Rough surfaces Surface waves |
| title | Design and fabrication of SiO/sub 2//Si/sub 3/N/sub 4/ CVD optical waveguides |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-21T21%3A57%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Design%20and%20fabrication%20of%20SiO/sub%202//Si/sub%203/N/sub%204/%20CVD%20optical%20waveguides&rft.btitle=1999%20SBMO/IEEE%20MTT-S%20International%20Microwave%20and%20Optoelectronics%20Conference&rft.au=Bulla,%20D.A.P.&rft.date=1999&rft.volume=2&rft.spage=454&rft.epage=457%20vol.%202&rft.pages=454-457%20vol.%202&rft.isbn=0780358074&rft.isbn_list=9780780358072&rft_id=info:doi/10.1109/IMOC.1999.866156&rft_dat=%3Cieee_6IE%3E866156%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=866156&rfr_iscdi=true |