Effect of Cu Edges on Delamination Strength in Cu-Stabilized CC Tapes Under Transverse Tension at 77 K
Delamination frequently occurs as a result of high transverse tensile stresses caused by fabrication and mechanical and thermal cycles during operation. It is generally known that transverse opening and peeling off are the primary delamination failure modes, and delamination strength is typically ev...
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Veröffentlicht in: | IEEE transactions on applied superconductivity 2019-08, Vol.29 (5), p.1-4 |
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description | Delamination frequently occurs as a result of high transverse tensile stresses caused by fabrication and mechanical and thermal cycles during operation. It is generally known that transverse opening and peeling off are the primary delamination failure modes, and delamination strength is typically evaluated using anvil or peel tests. To avoid transverse openings that cause delamination failures in coated conductor (CC) tapes, the tape structure can be changed by developing or adding the fabrication process. Thus, in most studies, delamination strength has been characterized in REBCO CC tapes with Cu-edges and the slit-side one. In this study, the delamination strengths of 12-mm-wide CC tapes without a slit edge and a 4-mm-wide CC tapes without Cu-edges were experimentally measured under transverse tensile loading at 77 K. Results were compared to those obtained during the mechanical delamination of CC tapes with Cu edges. The delamination morphologies were also observed macroscopically. |
doi_str_mv | 10.1109/TASC.2019.2893804 |
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It is generally known that transverse opening and peeling off are the primary delamination failure modes, and delamination strength is typically evaluated using anvil or peel tests. To avoid transverse openings that cause delamination failures in coated conductor (CC) tapes, the tape structure can be changed by developing or adding the fabrication process. Thus, in most studies, delamination strength has been characterized in REBCO CC tapes with Cu-edges and the slit-side one. In this study, the delamination strengths of 12-mm-wide CC tapes without a slit edge and a 4-mm-wide CC tapes without Cu-edges were experimentally measured under transverse tensile loading at 77 K. Results were compared to those obtained during the mechanical delamination of CC tapes with Cu edges. The delamination morphologies were also observed macroscopically.</description><identifier>ISSN: 1051-8223</identifier><identifier>EISSN: 1558-2515</identifier><identifier>DOI: 10.1109/TASC.2019.2893804</identifier><identifier>CODEN: ITASE9</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Coated conductor ; Coils ; Conductors ; Cu-edge ; Delamination ; delamination strength ; Failure modes ; Loading ; Morphology ; Peel tests ; Substrates ; Superconducting films ; surround Cu stabilizer ; transverse tension</subject><ispartof>IEEE transactions on applied superconductivity, 2019-08, Vol.29 (5), p.1-4</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2019</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c359t-49204480e7cadc3876ca6b96323d148c2116effc34b62dcc7d3964f9fdf836233</citedby><cites>FETCH-LOGICAL-c359t-49204480e7cadc3876ca6b96323d148c2116effc34b62dcc7d3964f9fdf836233</cites><orcidid>0000-0002-4922-2427</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/8616830$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/8616830$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Bautista, Zhierwinjay Mezona</creatorcontrib><creatorcontrib>Hyung-Seop Shin</creatorcontrib><title>Effect of Cu Edges on Delamination Strength in Cu-Stabilized CC Tapes Under Transverse Tension at 77 K</title><title>IEEE transactions on applied superconductivity</title><addtitle>TASC</addtitle><description>Delamination frequently occurs as a result of high transverse tensile stresses caused by fabrication and mechanical and thermal cycles during operation. It is generally known that transverse opening and peeling off are the primary delamination failure modes, and delamination strength is typically evaluated using anvil or peel tests. To avoid transverse openings that cause delamination failures in coated conductor (CC) tapes, the tape structure can be changed by developing or adding the fabrication process. Thus, in most studies, delamination strength has been characterized in REBCO CC tapes with Cu-edges and the slit-side one. In this study, the delamination strengths of 12-mm-wide CC tapes without a slit edge and a 4-mm-wide CC tapes without Cu-edges were experimentally measured under transverse tensile loading at 77 K. Results were compared to those obtained during the mechanical delamination of CC tapes with Cu edges. The delamination morphologies were also observed macroscopically.</description><subject>Coated conductor</subject><subject>Coils</subject><subject>Conductors</subject><subject>Cu-edge</subject><subject>Delamination</subject><subject>delamination strength</subject><subject>Failure modes</subject><subject>Loading</subject><subject>Morphology</subject><subject>Peel tests</subject><subject>Substrates</subject><subject>Superconducting films</subject><subject>surround Cu stabilizer</subject><subject>transverse tension</subject><issn>1051-8223</issn><issn>1558-2515</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9kE1LAzEQhhdRsH78APES8Lw1X5tNjmWtH1jw0O05pMmkbml3a5IK-utNafE0M_A-M8NTFHcEjwnB6rGdzJsxxUSNqVRMYn5WjEhVyZJWpDrPPa5IKSlll8VVjGuMCZe8GhV-6j3YhAaPmj2auhVENPToCTZm2_UmdXmYpwD9Kn2irs-hcp7Mstt0v-BQ06DW7DKy6B0E1AbTx28IEVALfTywJqG6Ru83xYU3mwi3p3pdLJ6nbfNazj5e3prJrLSsUqnkimLOJYbaGmeZrIU1YqkEo8zlhy0lRID3lvGloM7a2jEluFfeeckEZey6eDju3YXhaw8x6fWwD30-qSnFjBOBa5lT5JiyYYgxgNe70G1N-NEE64NOfdCpDzr1SWdm7o9MBwD_eSmIkAyzP7jdbyM</recordid><startdate>20190801</startdate><enddate>20190801</enddate><creator>Bautista, Zhierwinjay Mezona</creator><creator>Hyung-Seop Shin</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-4922-2427</orcidid></search><sort><creationdate>20190801</creationdate><title>Effect of Cu Edges on Delamination Strength in Cu-Stabilized CC Tapes Under Transverse Tension at 77 K</title><author>Bautista, Zhierwinjay Mezona ; Hyung-Seop Shin</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c359t-49204480e7cadc3876ca6b96323d148c2116effc34b62dcc7d3964f9fdf836233</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Coated conductor</topic><topic>Coils</topic><topic>Conductors</topic><topic>Cu-edge</topic><topic>Delamination</topic><topic>delamination strength</topic><topic>Failure modes</topic><topic>Loading</topic><topic>Morphology</topic><topic>Peel tests</topic><topic>Substrates</topic><topic>Superconducting films</topic><topic>surround Cu stabilizer</topic><topic>transverse tension</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Bautista, Zhierwinjay Mezona</creatorcontrib><creatorcontrib>Hyung-Seop Shin</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on applied superconductivity</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Bautista, Zhierwinjay Mezona</au><au>Hyung-Seop Shin</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of Cu Edges on Delamination Strength in Cu-Stabilized CC Tapes Under Transverse Tension at 77 K</atitle><jtitle>IEEE transactions on applied superconductivity</jtitle><stitle>TASC</stitle><date>2019-08-01</date><risdate>2019</risdate><volume>29</volume><issue>5</issue><spage>1</spage><epage>4</epage><pages>1-4</pages><issn>1051-8223</issn><eissn>1558-2515</eissn><coden>ITASE9</coden><abstract>Delamination frequently occurs as a result of high transverse tensile stresses caused by fabrication and mechanical and thermal cycles during operation. It is generally known that transverse opening and peeling off are the primary delamination failure modes, and delamination strength is typically evaluated using anvil or peel tests. To avoid transverse openings that cause delamination failures in coated conductor (CC) tapes, the tape structure can be changed by developing or adding the fabrication process. Thus, in most studies, delamination strength has been characterized in REBCO CC tapes with Cu-edges and the slit-side one. In this study, the delamination strengths of 12-mm-wide CC tapes without a slit edge and a 4-mm-wide CC tapes without Cu-edges were experimentally measured under transverse tensile loading at 77 K. Results were compared to those obtained during the mechanical delamination of CC tapes with Cu edges. The delamination morphologies were also observed macroscopically.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TASC.2019.2893804</doi><tpages>4</tpages><orcidid>https://orcid.org/0000-0002-4922-2427</orcidid></addata></record> |
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subjects | Coated conductor Coils Conductors Cu-edge Delamination delamination strength Failure modes Loading Morphology Peel tests Substrates Superconducting films surround Cu stabilizer transverse tension |
title | Effect of Cu Edges on Delamination Strength in Cu-Stabilized CC Tapes Under Transverse Tension at 77 K |
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