Properties of an Internal U-Shaped Inductively Coupled Plasma Source Operated by Superimposed Dual Frequency

Plasma properties of a U-shaped internal inductively coupled plasma (ICP) source (2.3 m long) operated by superimposed dual frequency was investigated as a function of power ratio of dual frequency composed of 2/13.56 MHz and 6/13.56 MHz. For the 2.3-m long linear internal-type ICP source, the use o...

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Veröffentlicht in:	IEEE transactions on plasma science 2018-09, Vol.46 (9), p.3159-3164
Hauptverfasser:	Kim, Do Han, Kim, Tae Hyung, Lee, Soo Jung, Lee, Won Oh, Kim, Kyong Nam, Yeom, Geun Young
Format:	Artikel
Sprache:	eng
Schlagworte:	Antennas Dual frequency flexible displays Inductively coupled plasma inductively coupled plasma (ICP) Ion bombardment Ions Iterative closest point algorithm linear plasma source Nonuniform plasmas Plasma Plasma density Radio frequency Standing waves Substrates wearable devices
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